Extreme Lithography & Materials Innovation Center

The UDM project, led by Argonne National Laboratory, will focus on precise, atomic-scale control of dynamic behavior in three classes of nanostructured materials that can collectively revolutionize memory: scale-free ferroelectrics and spin memories (on-chip); and a new optically addressed atomic memory (off-chip). Such memory will be non-volatile, fast, analog-to-multibit tunable, up to 1000× denser than today’s, and applicable across many architectures, from embedded to neuromorphic. The research will unveil the underlying science to establish this control over materials processes and quantifying system impact.

FEATURES

UDM is leveraging the computational resources of the Argonne Leadership Computing Facility (ALCF), including leadership-class supercomputers (e.g., the exascale Aurora system), AI Testbed, visualization clusters, advanced data storage systems, and high-performance networking capabilities. Electron microscopy facilities at Argonne's Center for Nanoscale Materials (CNM) will be used for nanoscale imaging of materials and devices.