ALD is essential for forming uniform thin films at the atomic level, making it a critical tool for high-performance fuel cell electrolyte deposition. With precise thickness control, exceptional uniformity, and high step coverage, ALD can create consistent films even on complex structures, maximizing the performance of electrolytes and electrodes. Since the lifespan and efficiency of fuel cells heavily depend on electrolyte properties, ALD is invaluable for optimizing these characteristics. For example, precisely depositing Y₂O₃ and ZrO₂ using ALD forms a YSZ (Yttria-Stabilized Zirconia) electrolyte that maintains high ionic conductivity and stability at elevated temperatures.
Sputtering process involves directing high-energy ions at a target material, causing atoms to be ejected and deposited onto a substrate as a thin film. This technique excels at creating high-density, uniform films with precise thickness. It enables the accurate deposition of various materials, such as metals, oxides, and alloys, forming a pure film that retains the inherent properties of the target material without chemical reactions. Additionally, sputtering can be performed at low temperatures, minimizing substrate damage and allowing easy thickness control, making it especially suitable for depositing fuel cell electrode materials. This process plays a crucial role in enhancing the electrochemical performance and durability of electrodes.