Fabrication Equipment 

eNJ-Eco

• Frame Structure: rack type

• This equipment utilizes advanced printing technology to achieve high-resolution and high-precision patterning beyond the limitations of conventional industrial printing systems.

• It enables precise material deposition and pattern formation for research on next-generation printing processes and advanced micro-/nano-fabrication techniques.

• The Mask Aligner & Exposure System enables precise photolithographic pattern transfer through accurate mask alignment and controlled UV exposure.

• It is widely used for microfabrication processes such as photoresist patterning and microstructure fabrication in semiconductor and MEMS device research.