9/07-Present: Inha University, Professor

• M3D integration, low temperature anneals processes

• CMOS scaling, Device reliability, Post-CMOS technology

• Contributed to develop high performance reliable gate stack using high-k/metal gate

7/14 - 8/15: University of Texas at Dallas, Research Scientist

• CMOS reliability

• Worked with Professor Jiyoung Kim

1/11 - 2/14: KEIT, Program Director

• R&D Planning for Semiconductor Process and Equipment Industry

1/04 - 8/07: SEMATECH, Project Engineer of ECR project

• Managing 1 fellow, 3 engineers, and 3 internship

• Developed novel reliability test methodologies for advanced gate stack devices

• Rated ad a high performance project in 2 consecutive years by Program Advisory Group

• Contributed to develop high performance reliable gate stack using high-k/metal gate

1/94 - 7/99: Daewoo Motor Company, Korea, Research engineer

• Developed reliability test methodology to predict lifetime of car emission parts

• 2013 Best Poster Award in Korean Conference of Semiconductor (KCS2012)

• 2012 Best Poster Award in Korean Conference of Semiconductor (KCS2011)

• 2008 SSDM Paper Award in International Conference on Solid State Devices and Materials in Japan

• 2004 Sematech Corporate Excellence Award

• 2002 - 2003 University Continuing Fellowship

• 2001 Highlight session in VLSI Symposium in Kyoto

• Process and device integration for future CMOS and memory application

• Novel device structure and materials for post CMOS technologies and flat panel display applications

• Novel device characterization methodology

• Semiconductor device technology and reliability physics

• Gate stack technology and reliability physics

• Oxide semiconductor and dielectric for low temperature processes

• Low-Temperature Fabrication of High Quality Gate Insulator in Metal-Oxide-Semiconductor Capacitor Using Laser Annealing, IEEE Electron Device Letters, 40(2),8606421, pp. 167-170

• Application of Single-Pulse Charge Pumping Method on Evaluation of Indium Gallium Zinc Oxide Thin-Film Transistors, IEEE Transactions on Electron Devices 65(9),8424088, pp. 3786-3790

• Solution-Processed Rb-Doped Indium Zinc Oxide Thin-Film Transistors, IEEE Electron Device Letters 39(9),8433896, pp. 1330-1333

• Low-Temperature Solution-Based In2O3 Channel Formation for Thin-Film Transistors Using a Visible Laser-Assisted Combustion Process, IEEE Electron Device Letters, 38(9),8000382, pp. 1259-1262

• Li-Assisted Low-Temperature Phase Transitions in Solution-Processed Indium Oxide Films for High-Performance Thin Film Transistor, Scientific Reports 6,25079

• 8 Invited talks on device characterization and reliability in international conferences

• Symposium organizer for IUMRS-ICEM2010

• Guest editor for Microelectronic Engineering

• Executive committee in International Symposium on Advanced Gate Stack Technology (2006-2008)

• Senior Member in IEEE Electron Device Society