Experimental techniques
A. Sample preparation techniques
The thin-films heterostructures would be grown in combination of sputtering, PLD and exfoliation of 2d flakes using similar tools shown below.
AJA sputter
(Image from Cornell University)
Thin film metal deposition
PLD
(Image from IIT B)
Oxide deposition
Glovebox
(Google image)
2d Material stacking
B. Nanoscale device fabrication
Micron and nano-size devices would be fabricated by optical lithography (OL) and electron beam lithography (EBL) respectively followed by the "lift-off" or "etching" processes. Argon ion milling is the primary tool for etching.
EBL (Raith)
(Image from IIT B)
OL (MJB)
(Image from google)
Ar-ion milling
(IntlVAC)
C. Device characterization
C.1 Electrical characterization
Spin-torque ferromagnetic resonance (ST-FMR) [Phys. Rev. Lett. 109, 096602 (2011)]
Second harmonic Hall measurement (SHH) [Phys. Rev. B 89, 144425 (2014)]
Hysteresis loop-shift [Phys. Rev. B 93, 144409 (2016)]
Local detection [Appl. Phys. Lett. 112 (2018)]
Non-local detection [Nature 561, 222 (2018)]
Spin-Hall magnetoresistance (SMR) [Phys. Rev. Lett. 110, 206601 (2013)]
Pulsed switching [Phys. Rev. Appl. 9, 9, 011002 (2018)]
etc.
C.2 Imaging of chiral magnetic structures
Magnetic force microscopy [Science 289, 930 (2000)]
Magneto-optic Kerr effect (MOKE) to detect skyrmions and chiral spin texture [Nat Mater 12, 611 (2013), Science 349, 283 (2015)]
etc.
Instruments
Keithley's current sources (2400 etc), Keithley's nanovoltmeter, Kepco power supply (20V-20A), DSP Signal Recover Lock-in amplifier 7265, Keysight arbitrary wave-form generator 33522B, RF and DC probes (picoprobe), Probe station, PPMS, SQUID, AFM etc.