Research

Exploration of Plasma-Materials Interaction in Semiconductor Manufacturing via Computational Methods

• Theoretical investigation of plasma etching from the reactor scale to the atomistic scale

• Multiscale simulations of the processing surface from atomistic to macroscopic feature scales

• Evaluation of functional characteristics of plasma-treated surface

• Development of a virtual process platform for semiconductor materials and process design

Machine Learning-Enhanced Computational Modeling

• Seamless scale-bridging using a reduced order modeling for plasma physics using deep learning

• Systematic multiscale modeling enhanced by data-driven approaches

• Development of machine learning interatomic potential for reactions on solid surfaces

Advanced Computational Mechanics for Materials Engineering

• Multiscale analysis of polymeric materials through molecular dynamics, coarse-grained simulations, and continuum mechanics

• Investigative insights into the interface and interphase of diverse nanomaterials

• Analysis of plastic deformation, viscoelastic properties, and tribological behaviors