Homework Assignment #6

Fall 2008 EE 477

Due Nov. 23, 2008 11:59 PM, online

Solutions will be posted morning of Nov. 24

Worth 1.5 regular assignments due to the length

Each problem in this assignment is worth 10% except Problem 9 is 20%.

The first 6 problems in this assignment focus on an inverter and the interconnections to and from the inverter. The inverter input is on 8 lambda wide metal 2 for 9805 microns, then goes through a via and contact to reach poly, then on poly for 150 microns, including the gates. The poly is 2.4 times minimum width. The inverter output is on n+ diffusion for 20 microns then goes through a contact to metal 1, and the metal 1 output goes to an output pad on the chip. The output passes through 1 contact cut (diffusion-metal) at the output of the inverter from p+ to metal 1, one contact cut from metal 1 to n+ and 1 contact cut from n+ to metal 1. A short metal 1 strap connects p+ at the PMOS drain to the n+ diffusion. The metal output wire is 4 lambda wide.

The inverter is shown below. The gate of the NMOS transistor in the inverter is 3 times unit size width, and unit size channel length, and the gate of the PMOS transistor is 12 times unit size wide and unit size channel length. lambda is .125 microns. Assume Vdd is 2.5v. Tox = 57 angstroms for thinox, and 5000 angstroms for thick oxide. Metal thickness is .4 microns. You can use these values for transistor betas: βn (beta)= 219.4 W/L μ A(microamps)/V2 and βp (beta)= 51 W/L μ A/V2 .This is the same situation as Assignment 6 from Spring 2008, but the questions asked are different. Our computations are from that solution.