研究発表

(1) 学術誌

  1. A. Pham, N, Fukunaga, Wenchang Yeh, S, Morito and T. Ohba, “Rapid annealing of Au thin films by micron chevron-shaped laser beam scanning toward growth of single-grain crystal”, Jpn. J. Appl. Phys. 60 SBBK06 (2021).

  2. Wenchang Yeh, Toshiki Shirakawa, and Anh Hoang Pham, “Tendency of crystal orientation rotation toward stable {001} <100> during lateral crystal growth of Si thin film sandwiched by SiO2”, Jpn. J. Appl. Phys. 60 SBBM06, (2021)

  3. Brian Giraldo, Wenchang.Yeh, Nobuhiko. Kobayashi, “Formation of single-crystal Cu2O strips in non-single-crystal CuO thin films by continuous-wave laser diode with micro-chevron laser beam”, J. of Materials Science, 29, 14105 (2020).

  4. Wenchang Yeh, Mitsuki Hirasue, Kaisei Ohtoge and Toshiaki Tsuchiya, “High performance thin-film transistors fabricated on a single crystal Si strip by micro chevron laser beam scanning method”, Jpn. J. Appl. Phys., 59, 071008 (2020).

  5. Wenchang Yeh, Toshiki Shirakawa, Anh Hoang Pham and Shigekazu Morito, “Twin formation in micro-chevron laser beam scanning induced one directional crystal growth in Si film on SiO2”, Jpn. J. Appl. Phys. 58, SGGJ05-1 (2020).

  6. Wenchang. Yeh, T. Shirakawa A.H. Pham, and S. Morito, “Lateral growth of 1.1-mm-long twin free Si stripe as a result of rotation suppression”, Jpn. J. Appl. Phys., 58(2018)SBBJ06. 

  7. Anh H. Pham, Wenchang. Yeh, S. Morito,  T. Ohba, “Selective growth of single-grain crystal in Al thin film by micron chevron-shaped laser beam scanning”, Thin Solid Films, 672(2018)100.

  8. Kuninori Kitahara, Wenchang Yeh and Akito Hara, “Analysis of defects in low-temperature polycrystalline silicon thin films related to surface-enhanced Raman scattering”, Jpn. J. Appl. Phys., 57(2017)011401_1-8. 

  9. Yasutaka Uchida, Tomoko Funayama, Yoshiaki Kogure, and Wenchang Yeh, ”Low-temperature Cu-induced poly-crystallization of electrodeposited germanium thin film on flexible substrate”, Phys. Status Solidi C 13, No. 10–12, (2016) 864. 

  10. Wenchang Yeh, Satoki Yamazaki, Akihisa Ishimoto and Shigekazu Morito, ”Single-grain growth in Si film by chevron-shaped cw laser beam scanning”, APEX,  9(2016) 25503. 

  11. Yasutaka Uchida, Tomoko Funayama, Yoshiaki Kogure and Wenchang Yeh Metal-induced low-temperature crystallization of electrodeposited Ge thin film, Jpn. J. Appl. Phys., 55(2016)31303.

  12. Yi-Ting Huang, Pinghui S. Yeh, Yen-Hsiang Huang, Yu-Ting Chen, Chih-Wei Huang, Cong Jun Lin, and Wenchang Yeh High Performance InGaN PIN Photodetectors Using LED Structure and Surface Texturing  IEEE Photonics Technology Letters 28 605-608 2015

  13. Wenchang Yeh and Wasa Takuya, “Single-crystal Si solar cells with pulsed-DC sputtered SiNx:H anti-reflection film and phosphoric-acid-diffused n+ emitter”, Jpn. J. Appl. Phys., 54(2015)08KD05-1. 

  14. Wenchang Yeh and Keisuke Tatebe, “Single-crystalline pin-Si thin-film solar cells grown on Si substrate by sputter epitaxy”, Jpn. J. Appl. Phys. 54(2015)08KD07-1. 

  15. Wenchang Yeh, Akihiro Matsumoto, and Keisuke Sugihara, “Sputter epitaxy of heavily doped p+/n+ Ge film on Si (100) by cosputtering with Al/Sb for solar cell application”, Jpn. J. Appl. Phys., 54 (2015)08KD08-1_4 . 

  16. Wenchang Yeh, Akihiro Matsumoto, Keisuke Sugihara and Hisataka Hayase, “Sputter Epitaxial Growth of Flat Germanium Film with Low Threading-Dislocation Density on Silicon (001)”,   10.1149/2.0091410jss, ECS J. Solid State Sci. Technol., 3, (2014)195. 

  17. Wenchang Yeh and Boting Huang, “Fabrication of poly-Si complementary metal oxide semiconductor inverter by all sputtering deposition process”, 10.1002/jsid.268, J. SID, 22, (2014)364.  

  18. Wenchang Yeh, Kyohei Tatebe, Keisuke Sugihara and Hsiangen Huang Direct-current sputter epitaxy of Si and its application to fabricate n+-emitters for crystalline-Si solar cells, Jpn. J. Appl. Phys., 53, (2014), 025502.

  19. Hsiangen Huang and Wenchang Yeh: “Continuous Si epitaxy by direct current magnetron sputtering”, Electrochem. Solid State Lett., 12, (2009), H67-H69. 

  20. Wenchang Yeh, Hsinchi Chen, Chihping Hsiao, Hsiangen Huang, Jengywan Jeng: “Superlateral growth of a-Ge film by excimer laser annealing”, Appl. Phys. Lett., 93, (2008), 094103-094105. 

  21. Wenchang Yeh, Dunyuan Ke, Chunjun Zhuang, Hsiangen Huang, and Yubang Yang: “Light absorptive underlayer enhanced excimer-laser crystallization of Si thin-film”, J. Mater. Res., 22, (2007), 2973-2980.

  22. Wenchang Yeh, Chunjun Zhuang, and Dunyuan Ke: “Growth rate measurement of lateral grains in silicon film during excimer laser annealing”, Jpn. J. Appl. Phys., 46, (2007), L611-L613.

  23. Chilchyuan Kuo, Wenchang Yeh, JiFeng Lee, JengYwan Jeng: “Effects of Si film thickness and substrate temperature on melt duration observed in excimer laser-induced crystallization of amorphous Si thin films using in-situ transient reflectivity measurements”, Thin Solid Films, 515, (2007), 8094 -8100.

  24. Wenchang Yeh, Hsiangen Huang, Ingchieh Niu, and Chienchou Chen: “Light Absorptive Underlayer Enhanced Super Lateral Growth in Excimer Laser Crystallization of Amorphous Silicon Film”, Jpn. J. Appl. Phys., 46, (2007), 1466-1468.

  25. Chilchyuan Kuo, Wenchang Yeh, Ji-feng Lee, and Jengywan Jeng: ”Temperature Dependence of Melt Duration during Excimer Laser Crystallization Using In-situ Optical Measurements”, Lasers in Eng., 17, (2007), 45-57.

  26. Wenchang Yeh, Dunyuan Ke, Chunjun Zhuang: “Enlargement of Grain Size and Location Control of Grain in Excimer-laser Crystallization of Si Film”, Proc. Mat. Res. Soc., 910, (2006), 0910-A14-01.

  27. Wenchang Yeh and Dun-yuan Ke: “Location control of super lateral growth grains in excimer laser crystallization of silicon thin films by microlight beam seeding”, Jpn. J. Appl. Phys., 45, (2006), L970-L972.

  28. Chil-Chyuan Kuo, Wenchang Yeh, Chia-Bin Chen, Jeng-Ywan Jeng: ” Monitoring the explosive crystallization phenomenon of silicon thin films during short pulse duration XeF excimer laser annealing using real-time optical diagnostic measurements”, Thin Solid Films, 515, (2006), 1651-1657.

  29. Shui-Yang Lien, Dong-Sing Wuu, Wenchang Yeh, Jun-Chin Liuc: “Tri-layer antireflection coatings (SiO2/SiO2–TiO2/TiO2) for silicon solar cells using a sol–gel technique” Solar Energy Materials & Solar Cells, 90, (2006), 2710–2719.

  30. Ginny Wang, Dah-Shyang Tsai, Ying-Sheng Huang, Alexandru Korotcov, Wenchang Yeh and Diah Susantia: “Selective growth of IrO2 nanorods using metalorganic chemical vapor deposition”, J. Mater. Chem., 16, (2006), 780-786.

  31. Wen-chang Yeh and M. Matsumura: "Proposed Sample Structure for Marked Enlargement of Excimer-Laser-Induced Lateral Grain Growth in Si Thin Films”, Jpn. J. Appl. Phys., 41, (2002), 1909-1914.

  32. Wen-chang Yeh and M. Matsumura: " Effect of Low-Melting Point Underlayer on Enlargement of Grain Size During Excimer-Laser-Induced Lateral Crystallization of Si Thin-Films", Jpn. J. Appl. Phys., 40, (2001), 3096-3100.

  33. Wen-chang Yeh and M. Matsumura: "Numerical Calculation of Excimer-Laser-Induced Lateral Crystallization of Si Thin-Films", Jpn. J. Appl. Phys., 40, (2001), 492-499.

  34. Wen-chang Yeh and M. Matsumura: "Preparation of Giant-Grain Seed Layer for Poly-Silicon Thin-Film Solar Cells", Jpn. J. Appl. Phys., 38, (1999), L110-L112.

  35. Wen-chang Yeh and M. Matsumura: "Low-Temperature Deposition of Poly-Crystal Silicon Thin-Films ", Proc. Mat. Res. Soc., 485, (1997), 73-77.

  36. Wen-chang Yeh and M. Matsumura: "Chemical-Vapor-Deposition of Nickel-Oxide Films from Bis-π-Cycropentadienyl-Nickel", Jpn. J. Appl. Phys., 36, (1997), 6884-6887.

  37. Wen-chang Yeh, R. Ishihara, S. Morishita and M. Matsumura: "Low- Temperature Chemical Vapor Deposition of Silicon-Nitride Film from Hexachloro-Disilane and Hydrazine", Jpn. J. Appl. Phys., 35, (1996), 1509-1512.

  38. R. Ishihara, Wen-chang Yeh, T. Hattori and M. Matsumura: "Effects of Light Pulse-Duration on Eximer-Laser Crystallization Characteristics of Silicon Thin Films", Jpn. J. Appl. Phys. 34, (1995),  1759-1764.


(2)招待講演

1. Wenchang Yeh: “Remarkable enlargement of excimer-laser induced lateral grain by photosensitive heat retaining layer” Proceedings of 1th Int’l. TFT conference, (Korea Institute of Science and Technology, 2005), pp.85-88.

2. Wenchang Yeh: " Remarkable enlargement of grain size in excimer-laser crystallization of Si film and fabrication of single crystalline Si array ", MRS 2006 Spring Meeting, Sanfrancisco, USA, April 2006.

3. Wen-Chang Yeh: “Enlargement of Grain Size and Location Control of Super Lateral Growth Grain in Excimer-laser Crystallization of Si Film”, Proceeding on the Int’l Display Manufacturing Conference and Exhibition (SID Taipei Chapter, 2008), pp.15-17.

4. 葉 文昌，黄 祥恩，陳 信吉：「Si膜のエキシマレーザ溶融再結晶化法においてマイクロレンズアレイを利用したラテラル結晶粒位置制御」： 日本電子情報通信學會・シリコン材料デバイス研究会(SDM)，沖縄，日本，2008年4月.

5. Wenchang Yeh, Boting Huang, “Fabrication of Poly-Si TFT CMOS Inverter by Direct Stencil Mask Patterning during Sputtering Film Deposition”, to be published on Proceedings of International TFT Conference (ITC), 2010.

6. 葉 文昌，「Si及びGeのエキシマレーザ結晶化過程の実時間観測」，第58回応物シンポジウム，24p-BK – 3, (2011).

7. 葉 文昌，方 昱斌，黄 祥恩，「Siスパッタエピタキシーによる単結晶Si太陽電池の作製」電子情報通信学技報, 111, pp.31-35頁, (2011).

8. 葉 文昌，「Ge膜のエキシマレーザ誘起スーパーラテラル成長」電子情報通信学会 信学技報, 112, p.55頁, (2012).

9. 葉 文昌，「チュートリアル:シリコン系薄膜太陽電池」，第10回薄膜材料デバイス研究会, (2013).

10. Wenchang Yeh, Akihiro Matsumoto, and Keisuke Sugihara, “Fast and low-temperature sputtering epitaxy of Si and Ge and its application to optoelectronics”, The 4th International Symposium on Next-Generation Electronics (ISNE 2015), Taipei, Taiwan (2015).

11. Wenchang Yeh, “Selective single grain growth in Si thin film on bended substrate by micro shevron laser beam scanning”, Optics & Photonics Taiwan International Conference (OPTIC), Taipei, Taiwan, (2016).

12. Wenchang Yeh, “Fabrication of single crystalline stripe in Si and Ge film on rolled flexible glass substrate by UV cw micro-chevron laser beam”, SPIE Optics + Photonics 2017, San Diego, USA (2017).

13. Wenchang Yeh and Seigo Moriyama, “Selective Formation of Single Crystal Si/Ge Stripe on Glass Substrate for TFTs by Novel μ-Chevron Laser Beam Annealing Method”, Int’l Meeting on Information Display iMiD 2018, Busan, Korea (2018).

14. 葉 文昌，「µシェブロン型レーザビーム走査によるSi/Ge膜の単結晶帯形成とその結晶評価」，電子情報通信学会技術研究報告, 118, pp.11-14, 2018.

15. Wenchang Yeh, “Single grain Si stripe on glass substrate formed by µCLBA and its application to single grain TFT”, 15th Int’l Thin-Film Transistor Conference, Okinawa Japan, (2019).

16. Wenchang Yeh, “High mobility TFT fabricated by all sputtering processes(暫定)”, 16th Int’l Thin-Film Transistor Conference, Shyanghai China, (2020).




(3) 国際会議論文集

1. Wen-chang Yeh, R. Ishihara, S. Morishita and M. Matsumura: "Low-Temperature Chemical Vapor Deposition of Silicon-Nitride Film from Hexachloro-Disilane and Hydrazine", Int'l Conf. on Solid State Devices and Materials, (Jpn. Soc. of Appl. Phys., 1995), pp.1509-1512.

2. Wen-chang Yeh, Y. Sano, T. Hattori and M. Matsumura: "Excimer-Laser-Processed Ultra-Large Grain Growth for Si Thin-Film Solar Cells", Proceeding on 16th Euro. Photovoltaic Solar Energy Conf., (WIP-Renewable Energies, 2000).

3. Wen-chang Yeh, Y. Uchida, S.Sugahara and M. Matsumura: "Application of Ultra-Low Refractive-Index Silica Film to Anti-Reflection Coating", Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, (Jpn. Soc. of Appl. Phys., 2000), pp151-152.

4. Y. Sano, Wen-chang Yeh and M. Matsumura: "Highly Packed and Ultra-Large Si grains Grown by a Single-Shot Irradiation of Excimer-Laser Light Pulse", 198th Electrochemical Society Proceedings, (Electrochemical Society, 2000), 261-268.

5. Wen-chang Yeh: “Preparation of Giant Grain Poly-Si Thin Film By Room Temperature Excimer Laser Annealing”, Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, (Jpn. Soc. of Appl. Phys., 2002), p153-155.

6. Wen-Chang Yeh and Yu-chung Liu: “Excimer Laser crystallization of silicon island with a peninsular structure as a nucleation site”, Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, (Jpn. Soc. of Appl. Phys., 2003), pp.159-161.

7. Jia-Xing Lin, Chi-Lin Chen, Yu-Chen Chen, Po-Hao Tsai, Wenchang Yeh, Yuchung Liu, Guozhao Chen: “Fabrication of large-grained poly-Si thin film by heat-retaining enhanced crystallization”, Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, (Jpn. Soc. of Appl. Phys., 2004), pp.157-159.

8. Wenchang Yeh, Yuchung Liu, Guozhao Chen, Jia-Xing Lin, Chi-Lin Chen,Yu-Chen Chen, Po-Hao Tsai: “Development of photosensitive SiOxNy film for 308nm wavelength by SiH4 based PECVD and its application to heat retaining enhanced crystallization method”, Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, (Jpn. Soc. of Appl. Phys., 2004), pp.247-249.

9. Wenchang Yeh, Guozhao Chen, Yuchung Liu, Jia-Xing Lin, Chi-Lin Chen,Yu-Chen Chen, Po-Hao Tsai: “Excimer laser annealing of low temperature semitransparent silicon oxynitride gate insulator” , Proceedings of the 11th International Display Workshops, (SID, 2004), pp. 515-518.

10. Wenchang Yeh, Guozhao Chen, Hsiangen Huang and Shenglu Lee: “Selective removal of SiOxNy semitransparent film over SiO2 film in the heat retaining enhanced crystallization method for fabrication of TFTs”, Proceedings of the 11th International Display Workshops, (SID, 2004), pp.511-513.

11. Wenchang Yeh, Hsiangen Huang, and Guozhao Chen: “Selective Removal of SiOxNy Semitransparent Film over SiO2 Film in the Heat Retaining Enhanced Crystallization Method for Fabrication of TFTs”, Proceeding on the Int’l Display Manufacturing Conference and Exhibition 2005 (SID Taipei Chapter, 2005), pp.459-461.

12. Wenchang Yeh, Shenglu Lee, Guozhao Chen , and Hsiangen Huang: “Excimer Laser Annealing of Low Temperature Semitransparent Silicon Oxynitride Gate Insulator”, Proceeding on the Int’l Display Manufacturing Conference and Exhibition 2005 (SID Taipei Chapter, 2005), pp.462-464.

13. Wenchang Yeh, Yuchung Liu, Guozhao Chen, Jia-Xing Lin, Chi-Lin Chen,Yu-Chen Chen, Po-Hao Tsai: “Development of photosensitive SiOxNy film for 308nm wavelength by SiH4 based PECVD and its application to heat retaining enhanced crystallization method”, Proceedings of Int’l Electron Devices and Materials Society 2004, (Taiwan Electron Devices and materials Society, 2004), pp305-308.

14. Wenchang Yeh: “Remarkable enlargement of excimer-laser induced lateral grain by photosensitive heat retaining layer” Proceedings of 1th Int’l. TFT conference, (Korea Institute of Science and Technology, 2005), pp.85-88.

15. Chilchyuan Kuo, Wenchang Yeh, Chiabin Chen, JengYwan Jeng: ”Evidence of explosive crystallization during excimer laser crystallization by time-resolved optical diagnostic measurement using He-Ne probe laser”, Proceedings of International Workshop on Active-Matrix Liquid-Crystal Displays, Kanazawa, Japan, July 2005, pp.191-194.

16. Wenchang Yeh, Chun-Jun Zhuang, Guozhao Chen, Chil-Chyuan Kuo, Jeng-Ywan Jeng: “Relations of melt duration of Si film during excimer laser annealing on lateral growth distance and crystallinity within a grain”, Proceedings of 2nd Int’l. TFT conference, (2006)pp.120-126.

17. Chunjun Zhuang, Wenchang Yeh, Chilchyuan Kuo, JengYwan Jeng: ”Melt duration of excimer laser annealing Si film with time-resolved optical reflection and transmission measurement”, Proceedings of International Workshop on Active-Matrix Flat-Panel Displays, (Jpn. Soc. of Appl. Phys., 2006) pp.167-170.

18. Wenchang Yeh, Dunyuan Ke, Mingci Zhou, Chun-Jun Zhuang: “Location control of super lateral growth grains in excimer laser crystallization of silicon thin films by micro-light beam seeding”, Proceedings of International Workshop on Active-Matrix Flat-Panel Displays, (Jpn. Soc. of Appl. Phys., 2006), pp.59-60.

19. Wenchang Yeh, Chunjun Zhuang, Dunyuan Ke: “Growth rate measurement of lateral grains in silicon film during excimer laser annealing”, Proceedings of 3rd Int’l. TFT conference, (SID - Mid Europe Chapter, 2007), pp.86-89.

20. Chil-Chyuan Kuo, Wen-Chang Yeh, Chih-Ping Hsiao, Jeng-Ywan Jeng: ” Melting and Recrystallization Mechanism of Amorphous Silicon Thin Films Upon XeF Excimer Laser Crystallization,” Proceedings of International Workshop on Active-Matrix Flat-Panel Displays, (Jpn. Soc. of Appl. Phys., 2007), pp.86-89.

21. Wen-Chang Yeh: “Enlargement of Grain Size and Location Control of Super Lateral Growth Grain in Excimer-laser Crystallization of Si Film”, Proceeding on the Int’l Display Manufacturing Conference and Exhibition (SID Taipei Chapter, 2007), pp.15-17.

22. Hanseng Dai, Hsinchi Chen, Hsiangen Huang, Wenchang Yeh: “Characteristics of TFTs fabricated on location controlled lateral grains”, Proceedings of International Workshop on Active-Matrix Flat-Panel Displays, (Jpn. Soc. of Appl. Phys., 2008), pp.63-64.

23. Chihyu Chang, Hansheng Dai, and Wenchang Yeh: ”Sputterring Deposition of High Quality SiO2 Films at Low Temperature.”, Proceeding of Taiwan Display Conference 2008, (SID Taiwan Chapter, 2008), pp.272-274.

24. Wenchang Yeh, Hsinchi Chen, and Hsiangen Huang, Chihping Hsiao and Jengywan Jeng: “Location Controlled Super Lateral Growth in Excimer Laser Crystallization of Germanium Thin Films” The Proceedings of the 5th International TFT Conference, (SID - Mid Europe Chapter, 2009), pp. 314-317.

25. Wenchang Yeh, Hsinchi Chen, Hsinyi Chiang, “Pulse-DC Reactive Sputtering Deposition of SiNx:H film and Its Application to Passivation and Anti-reflection Film of Si Solar Cells”, Proceedings of 17th International Workshop on AMFPD, Japan, p235-238, 2010.

26. Wenchang Yeh and Ryota Morioka, “376nm ultra violet laser diode annealing of Si thin films”, Proc. 2012 Int’l Conf. on Renewable Energy Research and Applications (ICRERA), Japan, 2012.

27. Wenchang Yeh and Ryota Morioka, “Oblique lateral grain growth of Si film in CW diode laser annealing”, Proceedings of 20th International Workshop on AMFPD, Japan, 2013.

28. Wenchang Yeh, Akihiro Matsumoto and Keisuke Sugihara, “High Growth-Rate Sputter-Epitaxy of Low Thread-Dislocation-Density Ge Film on Si (100) Substrate for Solar-Cell Application”, WCPEC 2014, 6th World Conference on Photovoltaic Energy Conversion, Japan, 4TuPo.7.43 2014.

29. Wenchang Yeh, Kyohei Tatebe and Keisuke Sugihara, “Single-Crystalline pin-Si Thin-Film Solar Cells Grown on Si Substrate by Sputter-Epitaxy” , WCPEC 2014, 6th World Conference on Photovoltaic Energy Conversion, Japan, 2TuPo.3.18, 2014.

30. Wenchang Yeh and Takuya Wasa, “C-Si Solar Cells Having Sputter SiNX:H as AR Film and Diluted Phosphoric Acid Diffused n+ Emitter”, 6th World Conference on Photovoltaic Energy Conversion, Japan, 4TuPo.7.49, 2014.

31. Wenchang Yeh, Akihiro Matsumoto, and Keisuke Sugihara, ”Fast and low-temperature sputtering epitaxy of Si and Ge and its application to optoelectronics, Proc. 2015 int'l symp. next-generation electronics, Taiwan, 1-3, 2015.

32. Wenchang. Yeh, S. Moriyama, “Growth of Single Crystal Stripe in Si Film on Rolled Flexible Substrate by Micro-ChevronShaped CW Laser Scanning”, Proc. of 23th Int’l Workshop on AMFPD, Japan, 2016.

33. Wenchang Yeh, “Selective single grain growth in Si thin film on bended substrate by micro shevron laser beam scanning”, Proc. Of Optics and Photonics Taiwan International Conference (OPTIC), Taiwan, 2016.

34. Wenchang Yeh, “Fabrication of single crystalline stripe in Si and Ge film on rolled flexible glass substrate by UV cw micro-chevron laser beam”, Proc. SPIE, USA, 103490R, 2017.