Multi-purpose UHV growth/spectroscopy Lab

Person in Charge: Dr. Miguel Angel Niño and Dr. Cristina Navío

Location: B35

Equipment

The experimental equipment has two independent UHV chamber, the first one is an Organic Molecular Beam Epitaxy (OMBE) system used for the growth of the films of the organic molecules and metals in ultra high vacuum (UHV) conditions:

6 different evaporators for metals, one commercial (Omicron) triple evaporator for metals and one commercial (Kentax) triple evaporator for organics, plus preparation samples facilities (sputtering and annealing). The OMBE is connected to a second UHV chamber devoted to the in situ chemical and electronic structure analysis by means of X ray photoemission Spectroscopy (XPS), with a monochromated X ray source (Al K α line) and UV lamp for Ultraviolet Photoemission Spectroscopy (UPS), and Low Energy Electron Diffraction (LEED). During 2013 a second OMBE system will be available, and it will be connected to a Magnetron Sputtering chamber for the growth of magnetic and oxides multilayers.Our future plan includes the setting up of an in situ magneto optic Kerr effect (MOKE) system for the study of the magnetic anisotropy, and complement the XPS with an Inverse Photoemission Spectroscopy (IPS) system.

Location for information and resources related to fostering creative expression using modeling and simulation.