Post date: Apr 17, 2012 6:29:07 AM
The Henderson group was recently awarded the 2011 SPIE Jeffrey Byers best paper award for their paper entitled "Design, Synthesis, and Characterization of Directly Photo-definable Guiding Layers for Directed Self-Assembly of Block Copolymers" presented at the 2011 SPIE Advanced Lithography symposium. The award was accepted by lead author Jing Cheng, who is a graduate student in the School of Chemistry and Biochemistry at Georgia Tech who is co-advised by Professor Henderson and Professor Laren Tolbert (Chemistry), at the recent 2012 SPIE Advanced Lithography Symposium in San Jose, CA. The goal of the work is to develop materials that can be spin coated onto a surface and patterned directly through radiation exposure and which can subsequently direct the assembly of block copolymers on the surface into nanostructures with long range order.