Recent Announcements


Henderson Group Wins Best Paper Award At Sematech 2011 International Symposium on Litho Extensions

posted Apr 16, 2012, 11:33 PM by Cliff Henderson

Professor Henderson and his group were awarded the best paper award at the recent Sematech sponsored 2011 International Symposium on Lithography Extensions for their paper entitled "Understanding the Fundamentals of Directed Self-Assembly for Nanoscale Patterning."  The award was accepted by Professor Henderson at the conference in Miami, FL. 

Henderson Group Wins 2011 SPIE Jeffrey Byers Best Paper Award

posted Apr 16, 2012, 11:29 PM by Cliff Henderson   [ updated Apr 16, 2012, 11:35 PM ]

The Henderson group was recently awarded the 2011 SPIE Jeffrey Byers best paper award for their paper entitled "Design, Synthesis, and Characterization of Directly Photo-definable Guiding Layers for Directed Self-Assembly of Block Copolymers" presented at the 2011 SPIE Advanced Lithography symposium.  The award was accepted by lead author Jing Cheng, who is a graduate student in the School of Chemistry and Biochemistry at Georgia Tech who is co-advised by Professor Henderson and Professor Laren Tolbert (Chemistry), at the recent 2012 SPIE Advanced Lithography Symposium in San Jose, CA.  The goal of the work is to develop materials that can be spin coated onto a surface and patterned directly through radiation exposure and which can subsequently direct the assembly of block copolymers on the surface into nanostructures with long range order.

Professor Henderson Receives Intel Outstanding Researcher Award

posted Apr 16, 2012, 11:22 PM by Cliff Henderson   [ updated Apr 18, 2012, 7:15 PM ]

Professor Henderson was recently awarded an Intel Outstanding Researcher Award for his group's work on understanding pattern collapse in photoresist nanostructures and for developing processes to help mitigate such pattern failures during the manufacture of advanced integrated circuits.

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