Advances in Gas-Ion Microscopy
The 2nd International Workshop of the PicoFIB Network
UCL, London 13.2.2019
The meeting gathered together current and potential users of gas-ion microscopy from 15 different institutes and explored the latest technological developments and applications of Helium, Neon, and Xenon FIB technologies.
Invited Speaker
- Dr Olga S. Ovchinnikova, Oak Ridge National Laboratory, USA
Research Themes
- Correlative nanoanalytics, nano-spectroscopy, and gas-ion SIMS
- Materials applications of gas-ion FIB
- Fundamentals and modelling of gas ion-solid interactions
- Advances in gas-ion microscopy instrumentation
- Optimising methodologies: tips & tricks
Meeting Organisers
PicoFIB network partners: The University of Sheffield and University College London
Olga S. Ovchinnikova, Oak Ridge National Laboratory, USA
Correlated Materials Characterization via Multimodal Chemical and Functional Imaging
Nico Klingner, Institute of Ion Beam Physics and Materials Research, HZDR, Germany
The Race against Time: TOF-SIMS in the HIM
José María De Teresa, CSIC, University of Zaragoza, Spain
Tunable W-C Nanotube Diameter by He+ Focused Ion Beam Induced Deposition
Jamie Potter, London Centre for Nanotechnology, UCL, UK
Embedding NbN Nanowires in Coplanar Waveguide Resonators Using a Neon Focused Ion Beam
Lothar Bischoff, Institute of Ion Beam Physics and Materials Research, HZDR, Germany
Mass Separated Focused Ion Beams from Liquid Metal Alloy Ion Sources
Pablo Orús, CSIC, University of Zaragoza, Spain
Vortex Transport in Superconducting W-C Nanostructures
Laura Wheatcroft, Department of Materials Science and Engineering, University of Sheffield, UK
He-ion Microscopy and Ne Secondary Ion Mass Spectroscopy of High Voltage Li-ion Cathode Materials
Nathan Cassidy, Surrey Ion Beam Centre, University of Surrey, UK
Duoplasmatron FIB for Deterministic Ion Implantation
Jakub Jadwiszczak, CRANN & AMBER Research Centres, Trinity College Dublin, Ireland
Single-layer Neuromorphic MoS2 Memtransistors Fabricated by Helium Ion Beam Irradiation
Stuart Boden and Tudor Scheul, School of Electronics and Computer Science, University of Southampton, UK
Helium Ion Microscopy of Nanostructured Black Silicon
Xiaomo Xu, Institute of Ion Beam Physics and Materials Research, HZDR, Germany
Towards a Vertical Nanopillar-based Single Electron Transistor – a High-temperature Ion Beam Irritation Approach
Eduardo Serralta, Institute of Ion Beam Physics and Materials Research, HZRD, Germany
Development of a Dedicated System for Scanning Transmission Helium Ion Microscopy
Nicholas Farr, Department of Materials Science and Engineering, University of Sheffield, UK
Secondary Electron Spectrometry – Helping to See the Truth about Your Sample?
Helen Jones, National Physical Laboratory, University of Surrey, UK
Metrological Comparison Between Gallium and Xenon FIB in Materials Processing
Ian MacLaren, School of Physics and Astronomy, University of Glasgow, UK
Why Cryo-FIB Thinning is Essential for Preparing AISb-containing Semiconductor, Heterostructures
Kai Arstila, Department of Physics, University of Jyväskylä, Finland
Atomic Force Microscopy of HIM Milled Bevels of Thin Films and Nanostructures
The event was sponsored by the Leverhulme Trust, ZEISS, and Thermo Fisher Scientific.