Extreme Lithography & Materials Innovation Center

Bruno La Fontaine

Bruno La Fontaine is a senior scientist at Berkeley Lab, Director of the Center for X-Ray Optics and Deputy Director of the Center for High-Precision Patterning Science (CHiPPS).  With over 30 years of experience in pioneering EUV lithography and high-power laser applications, he leads EUV mirror fabrication in the ANGEL project

while overseeing advanced EUV reflectivity and multilayer mirror (MLM) degradation studies using synchrotron beamline capabilities at the Advanced Light Source. After earning his Ph.D. in plasma physics from INRS, Bruno has held influential roles at Bell Labs, LLNL, AMD, Cymer, and ASML. A renowned innovator with over 40 patents and 130 publications, his extensive expertise drives cutting-edge solutions in next-generation lithography.

Email: blafontaine@lbl.gov

Projects: ANGEL