Patent
Selected Patents and Patent Applications (Guoliang Liu)
22. Guoliang Liu, Zhen Xu, Nuwayo Eric Munyaneza, “Upcycling of Polyethylene and Polyproylene and Their Mixtures to High-Value Surfactants,” IP Disclosure: VTIP 23-105, US Application No: 63/462,863.
21. Guoliang Liu, Dong Guo, “Mesoporous polyimide thin films as dendrite-suppressing separators for lithium-metal batteries”, U.S. Provisional Patent Application No. 63/341,782.
20. Guoliang Liu, Zhen Xu, “one order of magnitude valorization of polystyrene waste”, US Application No: 63/248,158.
19. Guoliang Liu, Tianyu Liu, “Porous Carbon Fiber Electrodes, Methods of Making Thereof, and Uses Thereof”, disclosure Serial No.: 62/791,498; PCT/US2019/050035.
18. Guoliang Liu, Zhengping Zhou, “Block copolymer porous carbon fibers and uses thereof”, US 62/660,881; WO2019204762 A1.
The following is licensed to Ford Motor Company.
17. Janice Lisa Tardiff, Cindy Sofia Barrera-Martinez, Guoliang Liu, Wenqi Zhao, “Porous Carbon Fibers Reinforced Rubber Composites”, Application number 17/340648.
The following are licensed to Waves Audio, ltd (Israel).
16. Gabriel Zeltzer, Gavriel Speyer, Meir Shaashua, Vlada Artel, Adi Levi, Doron Naveh, Assad U. Khan, Yichen Guo, Guoliang Liu, “Nanocomposite graphene polymer membrane assembly, and manufacturing method thereof”, US Patent app. 16/211,926; WO2019051750 (Licensed to Waves Audio, Ltd., Israel)
15. G. Liu, A. U. Khan, "Plasmonic nanoparticle layers with controlled orientation", WO2018136900A1. (Licensed to Waves Audio, Ltd., Israel)
The following are assigned to Sabic Global Technologies.
14. Roy R. Odle, Guoliang Liu, Timothy E. Long, Ke Cao, "Phosphonium bromide terminated polyimide with high tensile properties", EP 18215997.0. (Assigned to Sabic Global Technologies B. V.).
13. Roy R. Odle, Ke Cao, Guoliang Liu, Timothy E. Long, "Polyimide from metal free ionomers", EP18215998.8. (Assigned to Sabic Global Technologies B. V.).
12. R. R. Odle, K. Cao, G. Liu, T. E. Long, J. M. Dennis, "Polyimide oligomers, compositions, method of manufacture, and uses thereof", WO2018126146A1. (Assigned to Sabic Global Technologies B. V.).
11. R. R. Odle, K. Cao, G. Liu, T. E. Long, J. M. Dennis, "Telechelic poly(imide) oligomers, methods of manufacture, and uses thereof ", WO2018094028A1. (Assigned to Sabic Global Technologies B. V.).
The following are developed at Northwestern University.
10. C. A. Mirkin, G. Liu, D. J. Eichelsdoerfer, K. A. Brown, “Forming structure on substrate surface, comprises e.g. contacting substrate with tip coated with composition comprising e.g. structure precursor to get printed feature which is heated to get structure precursor aggregated printed feature”, WO Patent 2014039821-A1.
9. C. A. Mirkin, L. X. Wong, J. N. Chai, G. Liu, D. J. Eichelsdoerfer, K. A. Brown, “Forming sub-micron sized nanostructure by contacting substrate with tip coated with ink comprising block copolymer and nanostructure precursor to form printed pattern and immobilizing single biological species on nanostructure”, WO2013049409-A3.
8. C. A. Mirkin, J. N. Chai, L. X. Wong, G. Liu, D. J. Eichelsdoerfer, K. A. Brown, “Substrates having nanostructures having biological species immobilized thereon and methods of forming the same and methods of forming nanostructures on surfaces”, WO Patent 2,013,049,409A2.
7. C. A. Mirkin, X. Liao, K. A. Brown, G. Liu, A. L. Schmucker, S. He, W. Y. Shim, D. J. Eichelsdoerfer, B. Rasin, "Heat actuated and projected lithography systems and methods", US9766551B2.
6. C. A. Mirkin, G. Liu, D. J. Eichelsdoerfer, K. A. Brown,"Method for synthesizing nanoparticles on surfaces", US20150210868A1.
The following are licensed to Intel Corp.
5. P. F. Nealey, H. Kang, G. Liu, H. Yoshida, A. Ramirez-Hernandez, J. J. de Pablo, Y. Tada, “Fabricating thin film structures, comprises providing a block copolymer material between first and second surfaces, and ordering the block copolymer material to form a thin film including microphase-separated block copolymer domains”, WO2013040483-A1; US2013189504-A1; JP2013227479-A. (Licensed to Intel Corp.)
4. P. F. Nealey, H. Kang, G. Liu, H. Yoshida, Y. Tada, J. J. de Pablo, A. Ramirez-Hernandez, “Directed assembly of block copolymer films between a chemically patterned surface and a second surface”, WO Patent 2,013,040,483; US Patent 20,130,189,504A1. (Licensed to Intel Corp.)
The following are assigned to Hitachi GST, now Western Digital Corp.
3. E. A. Dobisz, J. S. Lille, G. Liu, R. Ruiz, G. Zeltzer, “Method using block copolymers for making a master disk with radial binary encoded nondata marks for nanoimprinting patterned magnetic recording disks”, US Patent 20,130,126,473A1. (Assigned to Western Digital Corp.)
2. T. Albrecht, E. Dobisz, G. Liu, R. Ruiz, G. Zeltzer, “Method using block copolymers for making a master disk with radial nondata marks for nanoimprinting patterned magnetic recording disks”, US Patent 20,130,105,437A1. (Assigned to Western Digital Corp.)
1. E. Dobisz, R. Ruiz, G. Liu, P. F. Nealey, “Method using block copolymers for making a master mold for nanoimprinting patterned magnetic recording disks with chevron servo patterns”, US Patent 20,120,217,220A1. (Assigned to Western Digital Corp.)