Facilities

Atomic Layer Deposition System-I
Furnace type, High T, Semiconductor

Atomic Layer Deposition System-II
Single type, Medium T, Metal

PEALD System-III
Single type, Medium T, Dielectric

DC/RF Sputtering System
for Electrodes, Semiconductors

Plasma system (Vacuum, AP)

Probe Station & Hot Chuck

Source Meter (~120fA)

Impedance Analyzer

Lab-Made Contact Angle Meter

Reactive Ion Etcher @INHA FAB

DC Sputtering System  @INHA FAB

Hume Hood