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Growth facilities:
Growth facilities:
Pulsed laser deposition chamber for epitaxial thin film growth.
Annealing furnace (1000 degrees Celsius)
Tube furnace (1400 degrees celcius)
Box furnace (1200 degrees Celsius). Used for single crystal growth.
Measurement setup
Measurement setup
Transport measurement setup. Used for measuring transport properties like linear resistivity, Hall resistivity in the presence of magnetic field at various temperatures. 50 K < T < 400 K. Maximum magnetic field upto 0.5 T.
Thermal conductivity measurement setup using 3-omega technique.
Magnetic Optical Kerr Effect (MOKE) measurement setup
Optical microscope interfaced with computer
Electromagnet with sample holder. Maximum magnetic field upto 0.5 T.
Departmental / Institutional facilities
Departmental / Institutional facilities
Physical property measurement setup (PPMS) for magnetization measurements
Physical property measurement setup (PPMS) for Magnetisation measurements.
Panalytical X'pert Pro (X-ray diffraction facility). Used for structural characterization of powder & thin film samples
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