Low-pressure plasma system

Plasma cleaner, Plasma ashing, Plasma etching & Plasma activation

Gas Supply: Mass-Flow-Controllers (MFCs)

• Available gasses: Argon, Oxygen, Hydrogen, Helium

Optional water cooling available

Electrodes: PE

Chamber dimensions: 240x420x240

Power: RF 300 Watt

13,56 MHz RF Generator

PC controlled