Facilities

Agilent Test Laboratory (1117 Ghausi Hall)

In partnership with Agilent (now Keysight Technologies), the DMRC established a core test facility with microwave/millimetre wave measurement capabilities up to 325 GHz. This includes a $1.5 M Agilent nonlinear vector network analyzer (PNA-X) and spectrum analysis test equipment (PXA) together with a $ 0.5 M advanced semi-automatic Microtech Summit 12000-AP probe station platform (see Fig. 1).

Fig. 1. (Upper left) Microtech Summit 12000-AP semi-automatic Probe Station Platform. (Upper right) DMRC Lab with microwave/millimeter-wave measurement capabilities up to 325 GHz. (Bottom left) 220 GHz Sheet Beam Travelling Wave Tube Amplifier under test. (Bottom right) Waveguide T/R module (frequency extenders) N5260-60004, 67 – 110 GHz.

Microwave Microsystems Lab (Kemper Hall, Room 2212)

The Microwave Microsystems Laboratory (MML) is part of Prof. Ahn-Vu Pham’s research group and is the home for design and characterization of devices, circuits and subsystems at microwave and millimeter-wave frequencies. The MML (http://www.ece.ucdavis.edu/mml/) is vertically integrated with characterization tools for devices to wireless communications systems. It is equipped with both on-wafer and package characterization tools. The major pieces of equipment and software available at the MML are listed in below.

  • Agilent Performance Network Analyzer E8364 B (45 MHz – 70 GHz) with unique mixer measurement capabilities (next generation of 8510C)
  • Cascade Microtech on-wafer probe station
  • Agilent Performance Spectrum Analyzer E4440A (DC –26.5 GHz)
  • Agilent ESG Digital RF Signal Generator E4438C (250 kHz – 6 GHz) and E8267C (25 kHz-20 GHz)
  • Agilent Vector Signal Analyzers 89441A and 89611A
  • Maury Microwave Load-pull System ATS (0.8 to 18 GHz)
  • Westbond wire bonder
  • Load-pull Accessories: bias tees, directional couplers, attenuators
  • Agilent Power Meters E4417A
  • Agilent Power Sensors E9325a
  • Agilent Pulse Generator 8114A (100V/2A)
  • Agilent Pulse Generator 8110A
  • Agilent Semiconductor Analyzer 4155
  • Agilent Digital Multimeter 34401A
  • Numerous accessories including DC supplies, calibration kits, micro-probers, microwave components, cables, etc.
  • Software: HFSS, CST, ADS, Sonnet, NI AWR, IC-CAP and Cadence

High Speed Integrated Circuits and Systems Lab (Academic Surge)

Professor Q. Jane Gu’s lab (http://www.ece.ucdavis.edu/hsics/)focuses on high speed integrated circuits and systems design, especially in mm Wave/sub-mm Wave/THz circuits/systems in CMOS and post-CMOS devices. Her lab is equipped with RF/Microwave/mixed-signal test instruments and accessories. Dr. Jane Gu’s lab is also equipped with computers with CAD tools for the DOE CMOS imaging project (Agilent ADS, Ansoft HFSS, Cadence). The facility includes an extensive array of test equipment, including: semiconductor parameter analyzer, CV analyzers, dynamic signal analyzer, impedance/gain-phase analyzer, S-parameter analyzer, RF amplifiers, power meter, matching networks, temperature-controlled oven, high-speed digital and analog oscilloscopes and function generators, power supplies for low-power/low-voltage and high power/voltage applications, networked computers for experiment control and data acquisition, noise figure meter, noise figure test set, spectrum analyzer, RF and DC probe stations.

Davis Advanced RF Technologies Lab (DART)- Kemper Hall

Professor Xiaoguang “Leo” Liu leads the Davis Advanced RF Technologies Lab (DART) which possesses a variety of state-of-the-art modeling, fabrication, and characterization tools which support a broad range of activities including MEMS developments. It is this latter capability which has been essential to our collaborations in the DOE plasma imaging arena. Fabrication activities are carried out in the UC Davis Center for Nano-MicroManufacturing (CNM2) as well as the UC Berkeley Marvell Nanofabrication Laboratory where we have full access and which provides additional fabrication and characterization equipment to complement the capabilities at UC Davis. In addition, through the UC Davis BME TEAM facility and the Engineering Fabrication Lab, he has access to various prototyping capabilities, such as CNC machining, 3D printing, injection modeling, and water-jet cutting at low cost.

UC Davis Center for Nano-Micro Manufacturing (CNM2)- Kemper Hall

CNM2 enables nanometer-scale lithography, deposition, etching, and characterization capabilities for leading-edge research in advanced materials, electronics, optics, and biomedical devices. CNM2 includes a 10,000 square-foot Class 100 cleanroom, offering a broad line of lithography tools with resolution capabilities down to 50 nm, metal and dielectric thin-film deposition, dry etching, as well as numerous characterization tools. In additional, the CNM2 has 5000ft2+ space which houses both a high-resolution SEM and FIB system used for sample characterization and TEM sample preparation. The facility is available for use 24/7 with dedicated staff available during business hours to provide training and assistance to all of its members. CNM2 equipment that will be critical to this program includes EVG620 semi-automated double-side mask aligner, EVG501 wafer bonder, and EVG810LT LowTemp plasma activation system bundle PlasmaTherm Versaline High Density Plasma Enhanced Chemical Vapor Deposition (HD PECVD) system, PlasmaTherm Versaline DSE-III deep silicon etch (DRIE) system, Kurt J. Lesker automated sputtering system, PlasmaTherm APEX ICP and RIE etchers.

Fig. 2: (a) PlasmaTherm Apex ICP etcher, (b) Annealsys As-One HT RTP atmospheric or vacuum processing chamber (up to 1500 °C) , (c) PicoSun R-Series Advanced PEALD, (d) EVG 620 Contact Mask Aligner for non-planar and selectively etched lithography, (e) Map of the CNM2 facilities

The Microwave/Millimeter Wave Laboratory (3182 Kemper Hall)

The Microwave/Millimeter Wave Laboratory is employed for both teaching and research activities. On the teaching side, students learn passive and active RF and microwave device analysis, and the design, fabrication, and testing of RF and microwave filters and circuits. In the course of their studies, the students also learn how to operate state-of-the-art microwave equipment (see Fig. 3) courtesy of generous donations from Agilent Technologies (now Keysight Technologies). A compact, 15 ft. long computerized, anechoic chamber (see Fig. 4) is available for both teaching and research use for antenna pattern testing at microwave (≤ 40 GHz) and millimeter-wave frequencies (40-220 GHz and above). The primary plasma diagnostics research in this facility has been directed toward imaging array development, quasi-optical beam splitter and notch filter arrays, and the use of phased antenna arrays for beam steering and beam focusing/defocusing applications for imaging reflectometry.

Fig. 3. Photographs of the teaching (left) and research (right) portions of the Microwave/ Millimeter-Wave Laboratory (3182 Kemper Hall).

Fig. 4. Photographs of the interior (left) and exterior (right) of the computer-controlled microwave anechoic chamber and vector network analyzer system (3182 Kemper Hall).

Power Electronics Laboratory (Kemper Hall)

The Power Electronics Laboratory is directed by Professor Srabanti Chowdhury with whom we are collaborating on the development of wide bandgap and ultra-wide bandgap electronics for fusion plasma diagnostics. and is furnished, facilitated, and equipped to perform high voltage and high power measurements up to 3 kV, high temperature I-V and C-V measurements up to 400 °C and Hall effect measurements at a variety of temperatures from 4K (-269 °C) to 1273K (1000 °C). Equipment for device characterization includes: Cascade EPS150 Tesla probe-station; SemiProbe PS4L probe-station; Sourcing Units – Keithley 4200 SCS with ultrafast 4225 PMU; Agilent 4284A precision LCR meter and the 4155B and 4155C as semiconductor parameter analyzer; as well as 4225 PMU module; Keithley 2410, 2450 and 2657; DC Curve Tracer; Pulsed I-V systems. Equipment for material characterization includes: Lake Shore Hall Measurement system; MDC Hg Probe. Chowdhury’s group is currently setting up their Microwave Plasma (5.5 kW) CVD system (MPCVD). This system is capable of the growth of high-quality diamond with bipolar doping which will be employed to provide substrates for fusion plasma diagnostics devices.

Vacuum Electronics, Fusion Plasma Diagnostics, and Millimeter Wave Instrumentation Laboratory (Spafford Rd., Davis)

The plasma diagnostics development work and testing as well as THz vacuum electronics R&D is carried out in Prof. Luhmann’s newly outfitted 12,000 ASF Spafford Road Laboratory facility (see Figs. 8-10 below) housing some of the Davis Millimeter Wave Research Center (DMRC) millimeter wave and THz facilities. This is located only 2.4 miles from the main campus (see building figures below). The state-of-the-art facility (Figure 9) houses a cleanroom, a chemistry room with three fume hoods, and six high temperature hydrogen ovens. The facility also has a dedicated machine shop including standard equipment as well as two high precision machining oriented center areas. In addition to high power and cooling handling capabilities of the research laboratory space, it also has a vacuum components dedicated clean storage area and an optical finishing laboratory.

As can be seen from Figs. 9 and 10, the facility was outfitted with testing of millimeter wave/THz vacuum electronics devices specifically in mind and contains a 3,500 ASF Millimeter Wave and High Power Microwave Lab in which vacuum electron devices (VEDs) are tested. This particular lab features 480 VAC 3 Phase, 1,200A service and overhead rails for electrical power supply. The HVAC system of the building keeps the lab ambient temperature within ± 2° C, even with large heat loads. The building HVAC system also maintains positive pressure in the lab, ensuring cleanliness and preventing contamination for outside sources. The lab features a dedicated chilled water supply system that can provide up to 141 kW of continuous cooling for water cooled testing equipment. Bay doors and an overhead crane are used for careful assembly and movement of sensitive equipment at the new facility.

On site, the facility features a high precision prototype machine shop available for quick and accurate parts fabrication or repairs, without the need to send parts away or to contract out for new parts. Welding facilities (laser and TIG) are also included in this shop. Of particular importance is the fact that the facility will feature three nano-CNC machines (see below) which have been essential in developing near-THz devices (see Figs. 11-17). This was made possible through an extremely productive collaboration over the past seven years with DMG-Mori (one of the world’s largest machine tools manufacturers) where we had sole access to a prototype NN1000 nano-CNC machine capable of manu­facturing tenths of microns sized parts with tolerances on the order of nanometers, comparable to micro-processing technology capabilities. This is a high productivity, high precision 5-axis CNC mill with sub-µm tolerance capabilities (<50 nm /100 mm position error) and the capability of providing surface roughness on the 10’s of nm scale. This capability will be greatly expanded in the Spafford facility as a result of the decision by DMG-Mori to donate three nano-CNC machines (estimated cost of each of the machines cost about $ 1.5 M as configured) to the DMRC which will be sited at the Spafford facility (see Fig. 6). Complete support capability ranging from preparation to final measurement is provided at the Spafford facility (see Fig. 7).

Figure 5: Spafford Rd. Laboratory

Figure 6: Spafford Road facility Layout; note the isolation pad specifically prepared for the Nano-CNC Machines used in near-THz device fabrication

Figure 7: Spafford Road facility prior to beneficial occupancy

Figure 8: Representative vacuum electron devices fabricated with a DMG-Mori NN1000 nano-CNC

Figure 9: Additional near-THz vacuum electron devices fabricated with a DMG-Mori NN1000 nano-CNC

Fig. 10. Photograph of a monocrystal diamond scribe (left), and a comparison of circuits fabricated with a conventional tungsten carbide tool (middle) versus a diamond tool (right).

Fig. 11. 220 GHZ SBTWT circuit fabricated at DTL, showing selected SEM images.

Figure 12: Machines operating at DMG-Mori (center); machines on truck during move to UC Davis; Set-up at Spafford Rd. (right)

Figure 13: Nano-CNC capability employed in near-THz TWT and BWO development

Figure 14: Nano-CNC support

In addition to the three DMG Mori nanoCNC machines, we have been awarded a DURIP grant for the purchase of a new Kern Pyramid Nano Nanoprecision CNC Machining Centre which is a high productivity ultra-precision 5-axis CNC mill with 0.5 µm tolerance capabilities. The Kern Pyramid Nano CNC machining center (Fig. 15) offers micro- and nano- fabrication capabilities and is well suited for the fabrication of high precision THz electronic devices.

Figure 15: KERN Pyramid Nano: Nanoprecision CNC Machining Centre

A wet lab and clean room are also available in the Spafford facility for any other process that may need to be conducted during the testing. The building has a dedicated high purity hydrogen and nitrogen supply system throughout all the labs for research use. Also available are facilities for brazing, with three ovens utilizing the high purity hydrogen supply. Finally, we have available to us a precision optics and optics grinding lab, which has been used to great effect augmenting our research and testing of high performance vacuum electronic devices. All these unique facilities have been used in concert to produce the highest quality vacuum electronics, and has a proven track record of success in the production and testing of cutting edge devices.

Our microfabricated TWT development makes use of the highly successful UC Davis program in developing high current nanocomposite thermionic cathodes for use in high power microwave and THz sources where the cathode emission current density exceeds the commercial state-of-the-art by more than an order of magnitude. Specifically, UC Davis produces nanocomposite tungsten scandate, high current density (> 100 A/cm2) cathodes for THz applications in dedicated Spafford fabrication facilities (see Fig. 16) which include sintering and brazing capability (see Fig. 17). Also shown in Fig. 18 is a photograph of the multiple rapid cathode life test facility employed to test these and other thermionic cathodes.

Fig. 16. Photographs of some of the equipment and facilities employed for fabricating cathodes.

Fig. 17. Photographs of temperature-controlled gas-injection ovens employed for sintering and brazing (left), and multiple rapid thermionic cathode life testing facilities (right).

As mentioned above, the Spafford facility has a 3,500 ASF laboratory space dedicated to millimeter wave/THz vacuum electronic device test and characterization. This lab houses a computer automated WR-4.3 backward wave oscillator (BWO) source and scalar network analyzer system for use between 170 and 260 GHz (see Fig 18). As another example, the group has had a large effort to develop sheet beam klystrons (SBKs) including a quasi-optical W-Band pulsed 50 kW WSBK and a 10 kW cw version. Figure 19 shows the pulsed tube on test where it delivered 51 kW with more than 40 dB gain which is a record for an O-type wave source at this frequency. More recently, as mentioned above and of direct relevance to the proposed NIH effort, the sheet beam technology has been extended to the THz region under the DARPA HiFIVE program where the TWT gain was measured to be over 30 dB in the frequency range of 197 to 202 GHz (BW ~ 5 GHz) and a peak power of over 110 Watts of power at 212.5 GHz in pulsed operation. Figure 20 shows the device under test using a cw capable power supply-modulator and ancillary diagnostics.

Fig. 18. Photograph of a WR-4.3 scalar network analyzer system for characterization measurements over a frequency range of 170-260 GHz.

Fig. 19. W-Band quasi-optical WSBK under test.

Fig. 20. DARPA HiFIVE 220 GHz sheet beam TWT under test.

The Spafford facility also has a separate magnetic fusion plasma diagnostics laboratory area established to provide novel diagnostics instrumentation for next generation magnetic fusion plasma devices. Recent developments have focused on active microwave imaging radar reflectometric (MIR) and passive radiometric electron cyclotron emission imaging (ECEI) millimeter-wave imaging instruments for the determination of density and temperature fluctuations on tokamak fusion devices around the world: DIII-D (ECEI/MIR), EAST (ECEI/MIR), HL-2A (ECEI), KSTAR (ECEI), TEXTOR (ECEI/MIR), and ASDEX-Upgrade (ECEI). Three large optical tables and computerized microwave/millimeter-wave test equipment are available for plasma diagnostics research (see Fig. 21), as well as a large aperture mechanical light chopper and quasi-optical hot load which is employed to characterize the noise performance of the ECEI and MIR imaging arrays. The laboratory also houses a large soldering and electronics assembly area (see Fig. 22) with which UC Davis has employed in the development of plasma diagnostic instrumentation for previous ECEI and MIR systems. Referring back to the facility outline (Fig. 7), there is also a laser lab which has been utilized for the development of far-infrared laser interferometers and polarimeter instruments and collective scattering systems for fusion plasma devices (see Figs. 23-25). Diagnostics instrumentation ranging from calorimetric power meters to waveguide components exist in both facilities and facilitate VED testing.

Fig. 21. Photographs of corrugated 673 GHz waveguide characterization (left) and ECEI optical system undergoing detailed optical characterizations prior to shipping to the HL-2A tokamak.

Fig. 22. Photograph of the electronics assembly and testing area (left), and the newly developed DIII-V-band (50-75 GHz) MMIC receiver array (right).

Figure 23. Laser table with Lexan enclosure removed. The overall dimensions are 144" long, 28" wide, and 84" tall. The 4 FIReTIP lasers are installed; however, the High-k Scattering lasers will be installed at a later date.

Figure 24. CO2 and Methanol lasers. The CO2 laser is in the foreground. The laser is currently energized as evidenced by the waveguide glowing purple.

Figure 25. FIReTIP lasers types shown together. From left to right, CO2 laser, Stark FIR laser, and FIR laser.

M. Saif Islam Nanotechnology Lab, (Kemper Hall)

Professor Luhmann is collaborating with Prof. Islam in the vacuum nanoelectronics area.

Growth Capability: Islam group has a cold-wall CVD reactor (Figure 26, left) from First Nano (CVD Equipment Corporation, NY) and has capabilities of growing semiconductor (Si, Ge, diamond) thin films and nano materials. The reactor has gases for both p and n-type doping of thin films and nano-columns, nanowires and nanowalls of Si, Ge and GaP. The tool is also equipped with in-situ electrical probing capability. The tool will be used for the growth of some pn and pin epi-layers.

Figure 26. (left) A customized Chemical Vapor Deposition (CVD) process tool for semiconductor crystal growth is possessed by Islam group; (middle) Schematics of a custom-built transfer printing tool in Islam’s lab for transfer printing of devices from mother substrates to secondary substrates; (Right) Photograph of the device printing tool.

Islam’s Lab has equipment for the characterization of a wide range of semiconductor devices and optical systems. The equipment and facilities for the PDs and PV characterization broadly fall under three categories: (1) Optoelectronic device characterization (2) Electrical device characterization and (3) High-speed device characterizations.

For the electrical characterization, current-voltage (I-V) and capacitance-voltage (C-V) measurements, Islam has HP4155B semiconductor parameter analyzer and Agilent/HP 4284A Precision LCR Meter. We have PV measurement equipment including Solar Cell Quantum Efficiency Measurement System and Solar Cell I-V Measurement System. This system irradiates solar cells with measures the I-V curve and computes critical parameters such as Voc, Isc, Jsc, Vmax, Imax, Pmax, and efficiency. Our system includes the light source and the measurement equipment needed to measure I-V curves for solar cells. Its solar simulator illuminates the test device while the electronic load sweeps the cell voltage from a reverse-bias condition, through the power quadrant, and beyond Voc. The system’s computer gathers data, calculates solar cell parameters, generates printable test reports, and saves test data in text files.

Simulation Tools: Prof. Islam has the capability for simulating solar cells - device and processes using Silvaco TCAD. The simulation results can benefit the design and characterization of the solar cells. Silvaco Tcad can simulate the construction of solar cell doping and geometry, the open circuit voltage, short circuit current, the spectral response, the illuminated and un-illuminated I-V characteristics and quantum efficiency. Silvaco TCAD can incorporate FDTD into simple transfer matrix analysis for textured cell. The group also has COMSOL tool with wave optics module that offers capabilities for electromagnetic wave propagation in linear and nonlinear optical media for accurate component simulation and optical design optimization. To understand light-material interactions within complex nano-scale structures and materials, the group uses Lumerical Solution as photonic simulation software that has great capabilities to address the most of design problems across a wide range of applications. For the optical characterization, such as transmission and reflection measurements Islam group has an Ocean Optics spectrometer (200 nm-1100 nm).

Figure 27. DC and high speed test setup. (A) Digital sampling oscilloscope and high speed probe station (B) (Top) Fiber based femtosecond laser (FPL) (Left bottom) Fiber coupled laser source (right bottom) SuperK SELECT multi-line tunable filter (C) SuperK EXTREME supercontinuum lasers for 500-2200nm wavelngths. (D) (down respectively) Calibrated Reference Cell and Meter, Quartz WindowKeithley 2400 Digital Sourcemeter and Newport Oriel 69907 Universal Arc Lamp Power Supply (E) Newport 67005 Solar Simulator with 150W power.

Islam group also built high-speed test setup to measure the quantum efficiency (QE) and for the characterization of PD Performance (DC and RF). For the high-speed characterizations, a mode-locked pulsed fiber laser having a wavelength of 850 nm, with a total output average power of 1 mW, a pulse width of sub picosecond (200fs) and a repetition rate of 20 MHz. For the QE measurements were conducted using a supercontinuum laser (600 nm-1100 nm) and a tunable filter that transmits a band of wavelengths with 1 nm width blocking the adjacent wavelength. Five discrete fiber couple lasers at 780, 800, 826, 848, 940 nm were also used to deliver DC light to the devices by a single-mode fiber probe on a probe station for the QE measurement.

Equipment in Islam’s Lab

  • HP/Agilent 4155 Semiconductor Parameter Analyzer
  • Tektronix DSA8300 Digital Sampling Oscilloscope
  • NKT SuperK EXTREME EXR-4 supercontinuum lasers
  • NKT SuperK SELECT nIR1 multi-line tunable filter
  • Calmar FPL-02SFF1 Fiber Based Femtosecond Laser (FPL)
  • Thorlab S1FC1550 Fiber coupled laser source
  • CLD1010LP - Compact Laser Diode/Temperature Controller with TO Can Mount for Pin Codes A, D, E, and G
  • Newport 67005 Solar Simulator with 150W power
  • 91150V Calibrated Reference Cell and Meter, Quartz Window
  • Newport Oriel 69907 Universal Arc Lamp Power Supply
  • S175C High-Power Microscope Slide Power Sensor for UV, Visible, and IR
  • S132C - Slim Photodiode Power Sensor, Ge, 700 - 1800 nm, 500 mW
  • S120UV - Standard Power Sensor, Si, 200 - 1100 nm, 50 mW
  • PM200 - Touch Screen Power and Energy Meter Console
  • PM100 - Console for the Digital Optical Power Meter
  • Keithley 2400 Digital Sourcemeter
  • Keithley Source Measure Unit Model: 236
  • Alessi Microtech on-wafer probe station
  • Electrical transport properties measurement setup with Cryofab cryostats
  • CVD Reactor for synthesis of nanowire and nanotubes (Firstnano)
  • Function Generator, Manufacturer: Agilent, Model: 33120A
  • Tunable laser, Manufacturer: HP, Model: 81689A
  • Vector Signal Analyzer, Manufacturer: Agilent, Model: 89410A
  • DSP Dual Phase Lock-in Amplifier, Stanford Research SR850
  • Optical Spectrum Analyzer, Manufacturer: HP, Model: 86142B
  • Probe Station, Manufacturer: KARL SUSS, Model: 115PM009
  • Digital Storage Oscilloscope, Manufacturer: Tektronix, Model: TDS714L
  • Semiconductor Parameter Analyzer, Manufacturer: HP, Model: 4145B
  • Precision LCR Meter, 20 Hz to 1 MHz, Manufacturer: Agilent 4284A
  • Microscope, Manufacturer: Leitz, Model: L515
  • Function/Arbitrary Waveform Generator, Manufacturer: Agilent 33250A
  • PNA Series Network Analyzer, 45 MHz to 50 GHz, Agilent E8364A
  • Ocean Optics Spectrometer (200nm-1100nm)
  • Ultrasound material synthesis setup
  • Vacuum glove box
  • Custom nanowire manipulation and transfer equipment

Design and Computing Facilities (Academic Surge)

Professor Luhmann’s computer facilities are housed in the Academic Surge building, which includes office space for the research and development staff, cubicles for the graduate students as well as office space for visiting scholars. The office area also includes a dedicated computer facility and tele- and video-conferencing center adjacent to this office space. The group possesses considerable microwave circuit/structure design and simulation capability that plays a major role in the group's technology developments. Workstations include: Multiple Intel quad-core systems built for speed and reliability to allow quick design and virtual prototyping capabilities, multiple dual processor Intel Zeon servers to handle complex field and PIC simulations, and a high speed gigabit network with a dedicated Web/FTP server to facilitate quick exchange of files and ideas between researchers. Each workstation is outfitted with commercial 2D and 3D software including: Ansoft HFSS for 3-D electromagnetic-field simulation, CST Microwave Studio, Ansoft Designer for high-performance RF/MMW design & analog verification, Maxwell 3D for magnetic field simulations and the powerful ADS simulation package for microwave circuit analysis. Other design and simulation tools include IE3D for imaging antennas and wide bandwidth electronics, Quickwave for quasi-optical filters and beam splitters, CodeV for FIReTIP, MIR and high-k scattering optics with Gaussian beam propagation analysis, Matlab and IDL for numerical analysis and visualization, and Spectre/SPICE and OrCAD/PSPICE for analog electronic circuit simulation. A dedicated 64core AMD Cluster is also available for advanced Magic 2D and 3D PIC simulations. The AMD cluster allows simulation of complex RF systems with unprecedented accuracy and speed; Intense MAGIC simulations that would otherwise take a month to complete using an advanced workstation are reduced to a matter of days, allowing faster “Design to Implementation.”