Facility
Agnitron Agilis Metal-organic Chemical Vapor Deposition (MOCVD) for oxide epi layers:
- Ga2O3, Al2O3, AlGaO, GeO2
Utah Nanofab, the largest facility dedicated to semiconductor research and development in the Northwest:
- On-campus shared micro/nanofabrication facilities: Utah Nanofab cleanroom
- On-campus shared material characterization (XRD, AFM, SEM, TEM, XPS/UPS, UV-Vis, Ellipsometry): Surface Science Lab (Utah Nanofab), and Material Characterization Lab
Electrical characterization labs (Labs of Prof. Kai Fu, Prof. Michael A. Scarpulla and Prof. Berardi Sensale Rodriguez):
- Probe station for testing high voltage (10 kV) and high current (50 A)
- High temperature on-wafer testing up to 600 C
- High temperature characterization up to 1100 C
- Probe station with Keithley 4200 SCS
- Cryogenic probe station/DLTS
- RF Probe Station & VNA
Device simulation
- Sentaurus
- COMSOL