Our research group is dedicated to developing backplane devices for next-generation displays. Our main research goals are to realize high-end oxide thin-film transistors based on various thin-film processes, treatment techniques and novel structures. Furthermore, for deformable devices, we utilize a novel process of delaminating fabricated oxide TFTs from rigid substrates. We aim to apply creative methods based on extensive expertise in various fabrication processes and material science.
Implementing high-end oxide TFTs for next-generation displays the optimization of various structures, processing methods, and materials.
high-performance ultra-thin oxide TFTs on various flexible substrate by the method of delamination and transfer.
📍LOCATION
대전광역시 유성구 동서대로 125 국립한밭대학교 신소재공학과 N8동 611호
📞TEL
+82-42-821-1250
jko914@hanbat.ac.kr