Facilities
We grow oxide thin films by pulsed laser deposition (PLD). Our system allows in-situ film characterization with reflection high energy electron diffraction (RHEED).
We grow oxide thin films by pulsed laser deposition (PLD). Our system allows in-situ film characterization with reflection high energy electron diffraction (RHEED).
We have access to the CAC-CNEA clean room (class 1000). The facilities include optical lithography, metal deposition (sputtering + e-beam evaporation), reactive ion etching, focused ion beam, among others.
We have access to the CAC-CNEA clean room (class 1000). The facilities include optical lithography, metal deposition (sputtering + e-beam evaporation), reactive ion etching, focused ion beam, among others.
Available in-house basic characterization tools include atomic force and scanning electron microscopy, 4-circle X-ray diffraction, low temperature magnetotransport measurements, benchmark electronics, etc.
Available in-house basic characterization tools include atomic force and scanning electron microscopy, 4-circle X-ray diffraction, low temperature magnetotransport measurements, benchmark electronics, etc.
We have access to advanced fabrication and characterisation tools, such as electronic lithography, aberration corrected transmission electron microscopy and magneto-electrical characterization at low temperatures (<2 K) and high magnetic fields, via collaborations with different institutions abroad.
We have access to advanced fabrication and characterisation tools, such as electronic lithography, aberration corrected transmission electron microscopy and magneto-electrical characterization at low temperatures (<2 K) and high magnetic fields, via collaborations with different institutions abroad.