Homework Assignment #5
E477 Spring 2017 Professor Parker
Hardcopies due in the course boxes in the basement of EEB 10 AM 4/10/17
OR Ecopies due 10 AM 4/10/17 using the "Assignment" Function on DEN
Assume lambda is .1 microns. Assume Vdd is 1.8 V, Vtp0 is -.7 V. and Vtn0 is .7 V. Vtpbodyeffect is -.9 V. and Vtnbodyeffect is .9 V.
Tox = 57 angstroms for thinox, and 5000 angstroms for thick oxide. Metal thickness is .5 microns.
You can use these values for transistor betas: _n (beta)= 219.4 W/L _ A(microamps)/V2 and _p (beta)= 51 W/L _ A/V2 .
e0 (epsilon) = 8.85 X 10 -14 F/cm, e_oxide(epsilon) = 3.9*_0, and e_silicon(epsilon) = 11.7*_0.
NA=4X1018cm-3 (substrate doping)
ND=2X1020 cm-3 (source/drain doping)
NA(sw)=8X1019 cm-3 (Sidewall (p+) doping)
ni2= 2.1X1020 cm-3 (intrinsic carrier concentration of silicon)
xj (diffusion depth) =32 nm
KT/q= .026 V (thermal voltage)
Cjbsn = 17.27 x 10-4 pF/ μm2 and Cjbswn = 4.17 x 10-4 pF/ μm (micrometer).
Cjbsp = 18.8 x 10-4 pF/ μm2and Cjbswp = 3.17 x 10-4 pF/ μm (micrometer).
1) (15%) Compute the worst-case rising and falling RC time constants at point B of the circuit below using the Elmore delay method. Assume all transistors are unit sized and wire capacitance is lumped. Assume Rchn = 2000 ohms. Cg(n+p) = 20 ff, Cd(n+p) = 20ff, and Cint = 10 ff. Rint for interconnect1 is 10 ohms, interconnect2 is 5 ohms, and interconnect3 is 7 ohms.