a) (2%) What region is each transistor in when Vin = 678 mV?
b) (3%) What can you conclude about the relation between Kp and Kn?
c) (3%) Which is greater – rise time or fall time?
d) (6%) The beta ratio for this technology is given to be 4. How can you improve your design to make rise time and fall time almost equal?
Question 5:
a) (8%) Visually inspect the Vout vs Vin curve from Q4 and estimate both the noise margins. Assume VOHmin = 1.8 V and VOLmax = 0 V.
If you can’t see the x-axis properly: The x-axis major markings are at every 0.3 V, starting from 0 up till 1.8. Each major interval has 5 minor markings, so each minor interval = 0.06 V. Approximate answers for noise margins are fine.
b) (6%)The width of the NMOS transistor is now increased from 300 nm to 600 nm. What is the effect on NMH and NML (do they increase/decrease)?
Question 6: Consider a 2-input XOR gate. It’s logic equation can be written in 2 ways:
Option 1: A XOR B = A.(~B) + (~A).B -> Sum-of-products uses 2-input NAND gates
Option 2: A XOR B = (A + B) . (~A + ~B) -> Product-of-sums uses 2-input NOR gates
a) (8%) Assume beta ratio = 4 and all NMOS transistors have width = 300 nm. You need to design 2-input NAND and 2-input NOR gates so that worst case rise time = worst case fall time. Calculate the width of PMOS for the NAND and NOR.
b) (2%) Which option of XOR is better for achieving a small design?