Homework Assignment #3

EE 477 Fall 2016 Professor Parker

Hardcopies due in the course boxes in the basement of EEB 5 PM 9/26/16

OR Ecopies due 5 PM 9/26/16 using the "Assignment" Function on DEN
To ensure academic privacy, please use a cover page on your homework hard copies that does not contain any work. Turn in EITHER a hard copy or ecopy, not both.

Assume for the problems below that Vdd = 1.8 V, Vtp0 is -.7 V. and Vtn0 is .7 V. Vtpbodyeffect is -.9 V. and Vtnbodyeffect is .9 V.

Assume ßn (kn)= 219.4 W/L µ A(microamps)/V2 and ßp (kp)= 51 W/L µ A/V2

lambda = 100nm

1. (10%) A PMOS transistor is in the saturation region. What values of the drain voltage keep it in the saturation region if Vg = .1v, and Vs = Vdd?


2. (10 %) An NMOS transistor has Vs = 0.7 V. Vd = 1.7 V. Is the transistor in the saturation region of operation when Vgs =1.3 V?


3. (5%) Show a cross section and identify the parasitic transistors that cause latch up for a p-well process. How does a silicon-on-insulator process prevent latchup?

4. (5%) Assume the channel between drain and source of a PMOS transistor is formed so that the transistor is in linear region. Is the channel formed with electrons or holes? If we continuously hold Vgs voltage constant while decreasing Vds, what would happen to the channel underneath the gate area? Would the transistor be at t=infinity in linear, saturation, or cut off region?


5. (7%) A design rule that specifies minimum width of metal prevents what type of fault? Minimum metal spacing prevents what type of fault?


6. (10%) Shown below are IV curves for NMOS transistors. Sketch similar curves for PMOS transistors.