Homework Assignment #5
Hardcopies due in the course boxes on the third floor of EEB 5 PM 11/6/15
Ecopies due 5 PM 11/6/15 using the "Assignment" Function on DEN
To ensure academic privacy, please use a cover page on your homework hard copies that does not contain any work. Turn in EITHER a hard copy or ecopy, not both.
Assume for the problems below that
Vdd= 1.8 V, Vtp = - 0.4 V, Vtn = 0.4 V, Vtp,BE = - 0.5 V, and Vtn,BE = 0.5 V.
Tox = 41 angstroms for thinox, and 5000 angstroms for thick oxide.
ε0 (epsilon) = 8.85 X 10 -14 F/cm and εoxide(epsilon) = 3.9.
lambda = 0.1 micron.
Cjbsn = 9.725 x 10-4 pF/ μm2 and Cjbswn = 2.27 x 10-4 pF/ μm (micrometer). Assume drain is the same.
Cjbsp = 11.57 x 10-4 pF/ μm2 and Cjbswp = 1.8 x 10-4 pF/ μm (micrometer). Assume drain is the same.
xj (diffusion depth) = 0.1 microns.
Assume ßn (kn)= 219.4 W/L µ A(microamps)/V2 and ßp (kp)= 51 W/L µ A/V2
1. (10%) Size a 3-input NAND gate to have the rise time faster than the fall time by a factor of two in the worst case.
2. (15%) Use the compound gate shown below. Label all drains and sources. Show an identical Euler path for both NMOS and PMOS transistors by listing transistor inputs on both paths. If you cannot find a complete Euler path, you might need to add an extra transistor or two. Do not rearrange the transistors.