Homework Assignment #3
EE 477 Fall 2015 Professor Parker
Hardcopies due in the course boxes in the basement of EEB 5 PM 9/25/15
OR Ecopies due 5 PM 9/25/15 using the "Assignment" Function on DENTo ensure academic privacy, please use a cover page on your homework hard copies that does not contain any work. Turn in EITHER a hard copy or ecopy, not both.
Assume for the problems below that Vdd = 1.8 V, Vtp0 is -.7 V. and Vtn0 is .7 V. Vtpbodyeffect is -.9 V. and Vtnbodyeffect is .9 V.
Assume ßn (kn)= 219.4 W/L µ A(microamps)/V2 and ßp (kp)= 51 W/L µ A/V2
lambda = 100nm
1. (10%) A PMOS transistor has Vs = 1.3 V , Vd = .9 V. Vg = .2 V. What region of operation is it in?
2. (10 %) An NMOS transistor has Vs = .2 V. Vd = 1.3 V. Is the transistor in the saturation region of operation when Vgs =1.3 V?
3. (5%) Show a cross section and identify the parasitic transistors that cause latch up. How does a twin-well technology prevent latchup?
4. (5%) Assume the channel between drain and source of an NMOS transistor is formed so that the transistor is in linear region. If we continuously decrease slowly Vgs voltage while keeping Vds constant, what would happen to the electrons underneath the gate area? Would the transistor be at t=infinity in linear, saturation, or cut off region?
5. (7%) Give us 2 design rules that prevent short circuits and 2 design rules that prevent open circuits.
6. (10%) Identify on the graph the portion(s) affected by the term Vds/2. Why do we typically ignore this term? When can't this term be ignored?