Experience

2009-now: the Military University of Technology, Institute of Optoelectronics, Laser-Matter Interaction laboratory (LMI), Warsaw, Poland

· Quasi-monochromatic, compact, tabletop EUV, at 13.8nm wavelength, optimization, and characterization,

· Soft X-ray sources, particularly sources in “water window” spectral range based on argon and nitrogen gas puff targets, optimization and characterization,

· High resolution imaging using EUV radiation and diffractive optics with sub-50 nm spatial resolution – development of a compact, desk-top, stand-alone microscope prototype capable of operating at 13.5nm wavelength, allowing for the acquisition of 48 nm spatial resolution images.

· Investigations of the influence of object thickness and source emission bandwidth on spatial resolution in EUV microscopy based on Fresnel zone plates.

· Testing the spatial resolution of a powder based P43 and crystal Ce:YAG scintillators.

· EUV and SXR backlighting (shadowgraphy, radiography) of an elongated and modulated single and double, uncooled and cooled gas puff target nozzles for various EUV/SXR applications.

· Soft X-ray microscopy in the “water window” spectral range using a laser plasma SXR source based on a double stream gas puff target and Wolter-type I objective: argon source λ=2.8-5nm, resolution ~1.1mm, nitrogen source, λ=2.88nm - resolution 850nm.

· Extreme ultraviolet photoionization of gases for lab-astrophysics experiments.

· Extreme ultraviolet tomographic imaging using double stream gas puff target source at 13.5nm wavelength.

· Soft X-ray microscopy in the “water window” spectral range using a laser plasma SXR source based on a double stream nitrogen/helium gas puff target and Fresnel zone plate optics with a spatial resolution of 60nm.

· Development of a method based on Signal-to-Noise (SNR) measurements for optimization and characterization of SXR microscopy images and for characterization and benchmarking of various SXR imaging systems.

· Development of a compact dedicated SXR “water-window” source for radiobiology studies, capable of internal (in a vacuum) and external (in helium atmosphere) sample irradiation.

· Contact microscopy system operating in the “water-window” spectral range by imprinting transmission images of biological samples in high resolution photoresists with a nanometer spatial resolution.

· Calibration of silicon carbide (SiC) detectors in the SXR and EUV range. quantum efficiency estimation.

· Experimental systems for soft X-ray absorption spectroscopy using a compact, plasma EUV/SXR source for material science applications, in particular near edge X-ray fine structure spectroscopy (NEXAFS)

· Nanoimaging using "water window" radiation of biological objects and three-dimensional electron density reconstruction in bioengineering and material science applications,

· Spectral X-ray coherence tomography in the “water window” spectral range for material science and biological applications with 2 nm axial resolution.

• Interaction of TW femtosecond (1J, 25fs) laser pulses with double stream gas puff target, hard X-ray and gamma radiation generation from gas and cluster targets.

• Compact experimental system for soft X-ray EXAFS (extended absorption fine structure) absorption spectroscopy using a plasma SXR source for material science applications.

• Angularly resolved testing of low reflectivity coatings and bandpass filters for space missions (NASA, USA) in the 115-122 nm wavelength range.

2010, 2012: Postdoctoral fellow at Colorado State University, Engineering Research Center for Extreme Ultraviolet Science and Technology, Fort Collins, CO, USA,

· Time-resolved Fourier holography at extreme ultraviolet wavelengths.

· Holography with extended reference by autocorrelation linear differential operation at extreme ultraviolet wavelengths.

2005-2008: Colorado State University, Engineering Research Center for Extreme Ultraviolet Science and Technology, Fort Collins, CO, USA

· Ph.D. thesis: “Applications of extreme ultraviolet compact lasers to nanopatterning and high resolution holographic imaging”.

· Extreme Ultraviolet nanopatterning using interferometric lithography with feature sizes below 50nm.

· Extreme Ultraviolet high resolution holographic imaging with sub-50nm spatial resolution and 3-D holographic imaging with lateral sub-200nm resolution.

· Numerical analysis of digital images for resolution and feature size estimation based on correlation analysis.

· Development of photonic devices using nano-fabrication in a photosensitive glass with Extreme Ultra-Violet Lasers.

· High numerical aperture tabletop soft x-ray diffraction microscopy with 70 nm resolution.

· Holographic nanopatterning, reconstruction of the computer-generated holograms at a EUV wavelength and Talbot imaging with 100nm spatial resolution.

· Extreme ultraviolet microscopy with 54nm half-pitch spatial resolution and 1ns temporal resolution using compact capillary discharge laser.

· Extreme ultraviolet microscopy with 55nm half-pitch spatial resolution in reflection mode for aerial, actinic EUV mask inspection.

2004: the Military University of Technology, Institute of Optoelectronics, Warsaw, Poland

· Master of science thesis project “Parametric oscillator pumped inside laser cavity with Q-switch”

· Involved also in liquid-jet Sn: based plasma source project.

· Spectral and spatial measurements of a laser-produced plasma EUV source for 13.5 nm based on a double stream Xe/He gas puff target.

· Participation in project “Laser-plasma EUV source based on a gas puff target for metrology of multilayer (Mo/Si) mirrors for the microelectronics processing technology”.