Intensive optimization of masks and sources for 22nm lithography

Post date: Apr 18, 2011 5:54:05 PM

Alan E. Rosenbluth, David O. Melville, Kehan Tian, Saeed Bagheri, Jaione Tirapu-Azpiroz, Kafai Lai, Andreas Waechter, Tadanobu Inoue, Laszlo Ladanyi, Francisco Barahona, Katya Scheinberg, Masaharu Sakamoto, Hidemasa Muta, Emily Gallagher, Tom Faure, Michael Hibbs, Alexander Tritchkov and Yuri Granik, Proc. SPIE 7274, 727409 (2009);