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Graduate School at OSU starting Fall 2020
Materials and Devices
Materials and Devices
Dr. John Conley Jr.'s lab group: Conley Emerging Materials and Devices Group
Relevant projects:
Relevant projects:
Internal photoemission software development:
Internal photoemission software development:
Internal photoemission is a method of determining the boundary between the conducting band and the conducting band of the metal and a near by insultor.
The image to the right shows how this works. Light with a specific wavelength is shined on one side of the device. Each wavelength has a specific energy, and when it is absorbed an electron will be excited by exactly the energy of the photon. If the energy is higher than the gap indicated by phi, then the electron will be excited over the barrier to excite current.
This amount of current can be used to find the energy barrier between metal and insulator.
IPE.pptxAtomic Layer Deposition (ALD)
Atomic Layer Deposition (ALD)
ALD describes the self limiting method of depositing thin films. This method relies on chemical reactions between a series of precursors. One common example is the deposition of aluminum oxide using a TMA process. TMA is a reactive chemical that can bond to the silicon surface, however after it has bonded to the surface it cannot react with itself. Paper summaries were completed weekly.
Lab equipment:
- R200
- Glove Box
- Custom Internal Photoemission (IPE) measurement system
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