FACILITIES at SMART-lab
BRUKER D2 Phaser X-ray Diffractometer
Structural characterization of all synthesized materials starts in this small but extremely efficient unit.
Dielectric properties measurement unit
Dielectric properties measurements of sintered pellets in the range -150C to 400C can be measured
RF-sputtering unit
Thin films of oxide materials are prepared for analysis of material property as well as device fabrication.
Sputter Coater unit
For depositing electrodes for electrical measurements and device characterization, thin films of metals are deposited using this technique.
Electrospinning unit
Nanorod of oxide materials are prepared for analysis of material property as well as device fabrication.
Photocatalytic Reactor
For performing Catalytic and Photocatalytic activity
2- Probe Measurement Unit
Hall effect measurement unit
Chemical Lab
A small chemical lab for synthesis of oxide materials. Each years there are more than hundred new chemical compounds are being synthesized from this space.
Chemical Fumehood
The environment where elements bind with the maximum possible homogeneity to form single phase materials.
Spin coating unit
Fabrication of composite thin films of Polymer+ Nanopowders for device fabrication
Hydrothermal autoclave
Synthesis of nanoparticles of pure and doped simple and complex oxides
1350 C furnace
Chemical Vapor Deposition (CVD) 1100 C Furnace
Thin films and nanostructure formation is carried out using the above CVD furnace
1100 C furnace
Electrochemical work station
Cyclic voltammetry and energy related testing unit used on various materials
Keithley Source Meter
Current -Voltage Characteristics and Light sensing properties of materials are investigated using this source meter
Poling unit
Used to generate polarization of ferroelectric domains for various experiments including changes of phase
Ultrasonicator for cleaning and de-coagulate particles
Weighing Balance for chemical synthesis
Uni-axial press for pellet preparation
Centrifuge for nanoparticle extraction