Publications
Key publications:
Journals:
P. Das, High-κ Oxide Charge Engineering on GaN for, Journal of Electronic Materials, March 2024, https://doi.org/10.1007/s11664-024-11074-0, IF 2.1
P. Das, H. Finch, H. J. Edwards, S. Almalki, V. R. Dhanak, R. Mahapatra and I. Z. Mitrovic, Accurate band alignment of sputtered Sc2O3 on GaN for high electron mobility transistor applications, Semiconductor Science and Technology, May 2024, https://doi.org/10.1088/1361-6641/ad4abe, IF 1.9.
P. Das, L. A. H. Jones, J. T. Gibbon, V. R. Dhanak, T. P. Manzanera, J. W. Roberts, R. Potter, P. R. Chalker, S.-J. Cho, I. G. Thayne, R. Mahapatra, and I. Z. Mitrovic “Band Line-up Investigation of Atomic Layer Deposited Ti-Al-O and Ga-Al-O on GaN”, ECS Journal of Solid State Science and Technology, v. 9, 2020, pp. 063003 (1-8), IF 2.070.
P DasJ, S. N. Supardan, J. D. Major, A. Hannah, Z. H. Zaidi, R. Mahapatra, K. B. Lee, R. Valizadeh, P. A. Houston, S. Hall, V. R. Dhanak and I. Z. Mitrovic “Band alignments of sputtered dielectrics on GaN”, Journal of Physics D: Applied Physics, v. 53, 2019, pp. 063003 (1-10), IF 3.207. (JJoint first-author).
K. Sawangsri, P. Das, S. N. Supardan, I. Z. Mitrovic, S. Hall, R. Mahapatra, A. K. Chakraborty, R. Treharne, J. Gibbon, V. R. Dhanak, K. Durose, P. R. Chalker “Experimental band alignment of Ta2O5/GaN for MIS-HEMT applications”, Microelectronic Engineering, v. 178, 2017, pp. 178-181, IF 2.523.
S. Biswas, A. D. Paul, P. Das, P. Tiwary, H. J. Edwards, V. R. Dhanak, I. Z. Mitrovic and R. Mahapatra, “Impact of AlOy Interfacial Layer on Resistive Switching Performance of Flexible HfOx/AlOy ReRAMs”, IEEE Transactions on Electron Devices, v. 68, 2021, pp. 3787-3793, IF 2.917.
A. D. Paul, S. Biswas, P. Das, H. J. Edwards, A. Dalal, S. Maji, V. R. Dhanak, A. Mondal and R. Mahapatra “Improved resistive switching characteristics of Ag/Al: HfOx/ITO/PET ReRAM for flexible electronics application” Semiconductor Science and Technology, v. 36, 2021, pp. 065006 (8pp), IF 2.508.
S. Maji, A. D. Paul, P. Das, S. Chatterjee, P. Chatterjee, V. R. Dhanak, A. K. Chakraborty, and R. Mahapatra “Improved Resistive Switching Performance of Graphene Oxide Based Flexible ReRAM with HfOx Buffer Layer” Journal of Materials Science: Materials in Electronics, v. 32, 2021, pp. 2936-2945, IF-2.478.
A. D. Paul, S. Biswas, P. Das, H. J. Edwards, V. R. Dhanak, and R. Mahapatra “Effect of Aluminum Doping on Performance of HfOₓ-Based Flexible Resistive Memory Devices”, IEEE Transactions on Electron Devices, v. 67, 2020, pp. 4222-4227, IF 2.917
S. Maji, S. Samanta, P. Das, S. Maikap, V. R. Dhanak, I. Z. Mitrovic, and R. Mahapatra “Set compliance current induced resistive memory characteristics of W/Hf/HfOx/TiN devices”, Journal of Vacuum Science & Technology B, v. 37, 2019, pp. 021204 (1-7), IF 1.416.
Conference Proceedings:
K. Sawangsri, P. Das, S. N. Supardan, I. Z. Mitrovic, S. Hall, R. Mahapatra, A. K. Chakraborty, R. Treharne, V. R. Dhanak, K. Durose, P. R. Chalker “Experimental band alignment of Ta2O5/GaN for MIS-HEMT applications”, Insulating Films on Semiconductors (INFOS) 2017, Potsdam, Germany. (Talk given by I. Z. Mitrovic)
P. Das, S. N. Supardan, I. Z. Mitrovic, V. R. Dhanak, A. Shaw, S. Hall, A. K. Chakraborty, R. Mahapatra “Band Alignment of Sputtered Al2O3/GaN for MIS-HEMT Applications” International Workshop on Physics of Semiconductor Devices (IWPSD) 2017, Kolkata, India. (Poster presented by P. Das)
L. A. H. Jones, P. Das, T. P. Manzanera, J. T. Gibbon, R. Potter, P. R. Chalker, R. Mahapatra, V. R. Dhanak, I. Z. Mitrovic “Atomic Layer Deposited TiO2/Al2O3 Nanolaminates on GaN” Insulating Films on Semiconductors (INFOS) 2019, Clare College, University of Cambridge, UK. (Talk given by P. Das)
P. Das, S. N. Supardan, J. W. Roberts, V. R. Dhanak, I. Z. Mitrovic, R. Mahapatra “Band alignment of ALD deposited ZrO2/GaN for MIS-HEMT applications” International Workshop on Physics of Semiconductor Devices (IWPSD) 2019, IIT Delhi, Delhi, India (Talk given by R. Mahapatra)
S. B. Tekin, P. Das, A. D. Weerakkody, N. Sedghi, S. Hall, I. Z. Mitrovic, M. Werner, J. S. Wrench, P. R. Chalker “Single and Triple Insulator Tunnel Rectifiers for Infrared Energy Harvesting” EUROSOI-ULIS 2020, Normandy, France (Virtual). https://doi.org/10.1109/EUROSOI-ULIS49407.2020.9365388.
I. Z. Mitrovic, P. Das, L. A. H. Jones, J. T. Gibbon, V. R. Dhanak, R. Mahapatra, T. P. Manzanera, J. W. Roberts, R. Potter, P. R. Chalker, S.-J. Cho and I. G. Thayne “(Invited) Band Line-up of High-k Oxides on GaN” ECS Transactions, v. 97, 2021, https://doi.org/10.1149/09701.0067ecst.
Patents:
Dr. Raginee Pandey, Mohammad Arsalan Sarmad, Ms. Nutan Kumari, Dr. Nareshkumar Ugranarashimaiah, Dr. Manjunath. K, Dr. Partha Das, "Reversible plasmonic assembly optimization device using metal nanoparticles", Indian patent, 202321078767 A, Issue No. 50/2023, Published on 15/12/2023