FACILITY
Wet bench
Wet bench
RIE
RIE
CF4, SF6, O2, Ar
RTA
RTA
Ar, N2, O2
Furnace
Furnace
SiO2, Diffusion doping
LPCVD
LPCVD
Poly-Si, SiN
ALD
ALD
HfO2, ZrO2, Al2O3
E-beam evaporator
E-beam evaporator
Al, Au, Pt, Ti, Ni etc.,
Sputter
Sputter
Mo, Ti, TiN, IGZO
Spin coater
Spin coater
Photo resist: AZ5214, GXR601, DNR-L300
Aligner
Aligner
Minimum resolusion 2nm