FACILITY

CF4, SF6, O2, Ar

Ar, N2, O2

SiO2, Diffusion doping

Poly-Si, SiN

HfO2, ZrO2, Al2O3

Al, Au, Pt, Ti, Ni etc.,

Mo, Ti, TiN, IGZO

Photo resist: AZ5214, GXR601, DNR-L300

Minimum resolusion 2nm

SMU, CMU, SPGU, WGFMU, High Power Measurement

SMU, PMU