Our lab is equipped with a diverse range of advanced instruments and systems to support high-precision material synthesis, device fabrication, and characterization. Below is an overview of the key facilities:
Clean room ISO standard 7
Our lab is equipped with state-of-the-art ISO 7 cleanroom facilities designed to meet the stringent standards of ISO 14644-1 for advanced particle protection during device fabrication. These cleanrooms, available in both modular hardwall and softwall configurations, provide a controlled environment with precise airflow and particle concentration management.
Key Specifications:
Particle Concentration Limits:
≤1,000,000 particles (≥0.1 µm per m³)
≤237,000 particles (≥0.2 µm per m³)
≤102,000 particles (≥0.3 µm per m³)
≤35,200 particles (≥0.5 µm per m³)
≤8,320 particles (≥1 µm per m³)
≤293 particles (≥5 µm per m³)
Air Changes Per Hour (ACH):
150–240 air changes per hour, ensuring a consistent and controlled environment.
Ceiling Coverage:
25–40% of the ceiling equipped with HEPA filters to achieve optimal airflow and particle filtration.
These cleanrooms enable precise and efficient fabrication processes, making them ideal for applications requiring moderate particle concentration control.
Spin coater (Apex Instruments: spinNXG-P1, EZspin-A1)
Speed Range: 50 – 12,000 RPM, offering flexibility for various thin-film applications.
Reproducibility: Highly consistent rotational speed ensures repeatable and uniform film thickness.
User-Friendly Interface: Intuitive controls for ease of operation and process customization.
Versatility: Suitable for diverse materials and coating requirements.
Low temperature Oven (300°C)
Designed for uniform heating and precise temperature control, suitable for low-temperature curing and annealing processes.
Hot plate with magnetic stirrers
Model: Lab Quest, Borosil, MHPS 550P, and 3 Plate-Daihan Scientific.
Features: Feedback control, digital timer function, and temperature precision for solution preparation and processing.
Chemical Balance: Shimadzu
Model: Sartorius BSA224S-CW.
Specifications: Maximum capacity of 220g with a resolution of 0.1 mg for high-accuracy weighing.
Muffle Furnace
Model: Shivam Instruments.
Specifications: Chamber size 6"x6"x12", capable of reaching temperatures up to 1000°C, suitable for material calcination and sintering.
Ultrasonicator
Model: PCi Analytics.
Application: Efficient dispersion and cleaning of materials in solution.
UV-Ozone substrate cleaner
Model: Holmarc HO-TH-UVT350.
Function: Effective surface cleaning and activation for device preparation.
Solar Simulator
Model: Peccell PEC-L01.
Features: 4x4 cm² light area, suitable for photovoltaic device testing under simulated sunlight conditions.
Thermal Evaporation System (6" wafer coating capacity)
Specifications: 6-inch wafer coating capacity.
Supplier: Nano Science and Technology Company.
Application: Thin-film deposition for device fabrication.
Manufacturer: STERICOX.
Features: Includes 4 stainless steel jars (25 ml capacity each) and various-sized balls for efficient material grinding and mixing.
Fume hood with laminar flow
Ensures a safe and controlled environment for handling chemicals and preventing contamination.
Chemical bench
Ensures a safe and controlled environment for handling chemicals and preventing contamination.
Manufacturer: STERICOX.
Specifications: Temperature range from 0°C to 70°C, relative humidity (RH) range from 10% to 90%.
Dry cabinets
For safe and moisture-controlled storage of sensitive materials and equipment.
1. SEM
2. XRD
3. TEM
4. AFM
5. PL/Raman
6. Hall Measurement
7. BET
8. UV-VIS/FTIR