Growth Techniques:

• Expertise in Molecular Beam Epitaxy (MBE) (M/S Omicron GmbH)

• Chemical Vapor Deposition (CVD)

• Physical Vapor Deposition (PVD)

• Chemical synthesis

• Laser Abletion

Ion beam Techniques:

• Low energy (30 KeV) ion implantation

• 3 MeV pelletron accelerator:

–Rutherford Backscattering Spectrometry (RBS)

–Particle-induced X-ray emission (PIXE)

–Implantation

Characterization Techniques:

• UHV-Reflection High Energy Electron Diffraction (RHEED)

• X-ray Diffraction (XRD), including grazing incidence XRD (GIXRD)

• Scanning tunneling microscopy (STM)

• Scanning Electron Microscopy (SEM) [Cross-beam system coupling a Carl Zeiss , Neon 40 scanning electron microscope (SEM , Gemini Column) and a Canion 31 focused ion beam(FIB, Orsay Physics), equipped with gas injection system (GIS, Orsay Physics), STEM detector, Four Quadrant Back scattered electron detector (Carl Zeiss), EDS detector (INCA, Oxford)]

• Environmental scanning electron microscope (ESEM) (FEI, Quanta-250) with heating (up to 1400°C) and cooling (up to -22 °C) stage attachments (familiar with in-situ experiments)

• Transmission Electron Microscopy (TEM) (JEOL JEM-2010)

• Familiar with atomic force microscopy (AFM) amd Kelvin probe force microscopy (KPFM)

• Familiar with various kinds of spectroscopic techniques: XPS, UV-Vis-NIR, Raman

Applications:

• Gas sensing

• Glucose sensing

• Field emission

Instrumentation:

• Experience in designing and installation of High-Vacuum and UHV growth chambers and surface characterization facilities.