Publications
Research at SCH
Research Before SCH
31. Thermal Atomic Layer Etching of ZnO...
Taewook Nam, Jonathan L. Partridge, and Steven M. George*
30. Area-selective ALD of ZnS...
Taewook Nam, and Steven M. George*
29. Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions
Taewook Nam, Troy A. Colleran, Jonathan L. Partridge, Andrew S. Cavanagh, and Steven M. George*
Chemistry of Materials, 2024, 36, 3, 1449–1458
28. Atomic Layer Deposition of Pt Nanoparticles Using Dimethyl(N, N‑dimethyl-3-butene-1-amine‑N) Platinum and H₂ Reactant and Its Application to 2D WS₂ Photodetectors
Dain Shin, Inkyu Sohn, Donghyun Kim, Jaehyeok Kim, Taewook Nam, Youngjun Kim, Jusang Park, Tatsuya Nakazawa*, Seung-min Chung*, and Hyungjun Kim*
Journal of Vacuum Science and Technology A 42, 012405
27. Growth Mechanism and Electrical Properties of Tungsten Films deposited by Plasma-enhanced Atomic Layer Deposition with Chloride and Metal
Taewook Nam, Troy A. Colleran, Jonathan L. Partridge, Andrew S. Cavanagh, and Steven M. George*
Chemistry of Materials, 2023, 35, 17, 6671–6681
26. Growth Mechanism and Electrical Properties of Tungsten Films deposited by Plasma-enhanced Atomic Layer Deposition with Chloride and Metal
Yujin Lee, Seunggi Seo, Taewook Nam, Hyunho Lee, Hwi Yoon, Sangkyu Sun, Il-Kwon Oh, Sanghun Lee, Jin Hyung Seo, Jang Hyeon Seok, and Hyungjun Kim*
Applied Surface Science, Volume 568, 1 December 2021, 150939
25. Hydrogen Barrier based on Chemical Trapping using Chemically–modulated Al₂O₃ grown by Atomic Layer Deposition for InGaZnO Thin Film Transistor
Yujin Lee#, Taewook Nam#, Seunggi Seo, Hwi Yoon, Chong Hwon Lee, Hyukjoon Yoo, Hyun Jae Kim, Wonjun Choi, Seongil Im, Joon Young Yang, Dong Wook Choi, Choongkeun Yoo, Ho-jin Kim, and Hyungjun Kim*
#These authors contributed equally. Selected as a cover.
ACS Applied Materials & Interfaces, 2021, 13, 17, 20349-20360
24. Two-Dimensional MoS₂ Charge Injection Memory Transistors Utilizing Hetero-stack SiO₂/HfO₂ Dielectrics and Oxide Interface Traps
Livia Janice Widiapradja#, Taewook Nam#, Yeonsu Jeong, Hye-Jin Jin, Yangjin Lee, Kwanpyo Kim, Sangyoon Lee, Hyungjun Kim*, Heesun Bae*, and Seongil Im*
#These authors contributed equally. Selected as a Cover.
Advanced Electronic Materials, 2021, 2100074
23. MoS₂ Doping by Atomic Layer Deposition of High-k Dielectrics using Alcohol as Process Oxidants
Whang Je Woo, Seunggi Seo, Taewook Nam, Youngjun Kim, Donghyun Kim, Jeong-Gyu Song, Jun Hyung Lim, Hyung-Jun Kim, and Hyungjun Kim
Applied Surface Science, 541 (2021) 148504
22. Atomic Layer Deposition of a Uniform Thin Film on 2-dimensional Transition Metal Dichalcogenides
(Selected as a Featured Article)
Taewook Nam, Seunggi Seo, and Hyungjun Kim
Journal of Vacuum Science and Technology A, 38, 030803 (2020)
21. Comparative Study on Atomic Layer Deposition of HfO₂ via Substitution of Ligand Structure with Cyclopentadiene
Sungmin Park, Bo-Eun Park, Hwi Yoon, Sanghun Lee, Taewook Nam, Taehoon Cheon, SooHyun Kim, Hwansung Cheon, Sangkyun Im, Taegeun Seong and Hyungjun Kim*
Journal of Materials Chemistry C (2020), 8, 1344-1352
20. Atomic layer deposition for nonconventional nanomaterials and their applications
(Invited Feature Paper)
Taewook Nam and Hyungjun Kim*
Journal of Materials Research (2020), 35(7) 656-680
19. Moisture Barrier Properties of Low-temperature ALD Al₂O₃ using Various Oxidants
Taewook Nam, Haksoo Lee, Sung Min Cho, Bonggeun Shong, Han-Bo-Ram Lee*, and Hyungjun Kim*
Ceramics International (2019), 45, 19105–19112
18. Hydrogen Barrier Performance of Lanthanum Oxide Deposited by Reactive Magnetron Sputtering
Yujin Lee, Chong Hwon Lee, Taewook Nam, Sanghun Lee, Il-Kwon Oh, Joon Young Yang, Dong Wook Choi, Choongkeun Yoo, Ho-jin Kim, Woo-Hee Kim*, and Hyungjun Kim*
Journal of Material Science (2019) 54: 11145
17. Low-temperature, High-growth-rate ALD of SiO₂ using Novel Aminodisilane Precursor
Taewook Nam, Hyunho Lee, Taejin Choi, Seunggi Seo, Chang Mo Yoon, Yunjung Choi, Heonjong Jeong, Hima K. Lingam, Venkateswara R. Chitturi, Andrey Korolev, Jong-Hyun Ahn, and Hyungjun Kim*
Applied Surface Science, 485 (2019) 381-390
16. Molecular Oxidation of Surface -CH₃ During Atomic Layer Deposition of Al₂O₃ with H₂O, H₂O₂, and O₃: A Theoretical Study
Seunggi Seo, Taewook Nam, Han-Bo-Ram Lee, Hyungjun Kim*, and Bonggeun Shong*
Applied Surface Science, 457 (2018) 376-380
15. High-Performance Ink-Synthesized Cu-Gate Thin-Film Transistor with Diffusion Barrier Formation
Whang Je Woo, Taewook Nam, Il‑Kwon Oh, Wanjoo Maeng, and Hyungjun Kim*
Metals and Materials International, 24 (2018) 652–656
14. Cobalt Titanium Nitride Amorphous Metal Alloys by Atomic Layer Deposition
Taewook Nam, Chang Wan Lee, Taehoon Cheon, Woo Jae Lee, Soo-Hyun Kim, Se-Hun Kwon, Hyungjun Kim*, and Han-Bo-Ram Lee*
Journal of Alloys and Compounds, 737 (2018) 684-692
13. Surface-Localized Sealing of Porous Ultralow-k Dielectric Films with Ultrathin (<2 nm) Polymer Coating
Seong Jun Yoon, Kwanyong Pak, Taewook Nam, Alexander Yoon, Hyungjun Kim, Sung Gap Im*, and Byung Jin Cho*
ACS Nano, 2017, 11 (8), pp 7841–7847
12. A Composite Layer of Atomic-layer-deposited Al₂O₃ and Graphene for Flexible Moisture Barrier
Taewook Nam, Yong Ju Park, Haksoo Lee, Il-Kwon Oh, Jong-Hyun Ahn, Sung Min Cho, Hyungjun Kim*, and Han-Bo-Ram Lee*
Carbon, 116 (2017) 553-561
11. Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-film Transistors
Whang Je Woo, Taewook Nam, Hanearl Jung, Il-Kwon Oh, Jeong-Gyu Song, Han-Bo-Ram Lee, Wanjoo Maeng*, and Hyungjun Kim*
IEEE ELECTRON DEVICE LETTERS, VOL. 37, NO. 5, MAY 2016
10. High‐performance Alternating Current Electroluminescent Layers Solution Blended with Mechanically and Electrically Robust Nonradiating Polymers
Seong Soon Jo, Sung Hwan Cho, Hae Jin Kim, Taewook Nam, Ihn Hwang, Seok-Heon Jung, Richard Hahnkee Kim, Dhinesh Babu Velusamy, Ju Han Lee, Taejoon Park, Jin Kyun Lee, Dae-Eun Kim, Hyungsuk Lee, Hyungjun Kim, Cheolmin Park*
JOURNAL OF POLYMER SCIENCE, PART B: POLYMER PHYSICS 2015, 53, 1629–1640
9. Growth Characteristics and Properties of Indium Oxide and Indium-doped Zinc Oxide by Atomic Layer Deposition
Donghyun Kim, Taewook Nam, Jusang Park, Julien Gatineau, Hyungjun Kim*
Thin Solid Films 587 (2015) 83–87
8. Growth Characteristics and Properties of Ga-doped ZnO (GZO) Thin Films Grown by Thermal and Plasma-enhanced Atomic Layer Deposition
Taewook Nam, Chang Wan Lee, Hyun Jae Kim, Hyungjun Kim*
Applied Surface Science 295 (2014) 260–265
7. Graphene as an Atomically Thin Barrier to Cu Diffusion into Si
Juree Hong, Sanggeun Lee, Seulah Lee, Heetak Han, Chandreswar Mahata, Han-Wool Yeon, Bonwoong Koo, Seong-Il Kim, Taewook Nam, Kisik Byun, Byung-Wook Min, Young-Woon Kim, Hyungjun Kim, Young-Chang Joo and Taeyoon Lee*
Nanoscale, 2014, 6, 7503–7511
6. Direct Imprinting of MoS₂ Flakes on a Patterned Gate for Nanosheet Transistors
Kyunghee Choi, Young Tack Lee, Sung-Wook Min, Hee Sung Lee, Taewook Nam, Hyungjun Kim, and Seongil Im*
Journal of Materials Chemistry C, 2013, 1, 7803
5. Nanosheet Thickness-modulated MoS₂ Dielectric Property Evidenced by Field-effect Transistor Performance
Sung-Wook Min, Hee Sung Lee, Hyoung Joon Choi, Min Kyu Park, Taewook Nam, Hyungjun Kim, Sunmin Ryu and Seongil Im*
Nanoscale 2013, 5, 548-551
4. MoS₂ Nanosheet Phototransistors with Thickness-Modulated Optical Energy Gap
Hee Sung Lee, Sung-Wook Min, Youn-Gyung Chang, Min Kyu Park, Taewook Nam, Hyungjun Kim, Jae Hoon Kim, Sunmin Ryu, and Seongil Im*
Nano Letters, 2012, 12 (7), pp 3695–3700
3. Low-temperature Atomic Layer Deposition of TiO₂, Al₂O₃, and ZnO Thin Films
Taewook Nam, Jae-Min Kim, Min-Kyu Kim, Woo-Hee Kim, Hyungjun Kim*
Journal of the Korean Physical Society, Vol. 59, No. 2, August 2011, pp. 452-457
2. The Effects of Ultraviolet Exposure on the Device Characteristics of Atomic Layer Deposited-ZnO:N Thin Film Transistors
Jae-Min Kim, S. J. Lim, Taewook Nam, Doyoung Kim, and Hyungjun Kim*
Journal of The Electrochemical Society, 158 (5) J150-J154 (2011)
1. Atomic Layer Deposition ZnO:N Flexible Thin Film Transistors and the Effects of Bending on Device Properties
Jae-Min Kim, Taewook Nam, S. J. Lim, Y. G. Seol, N.-E. Lee, Doyoung Kim, and Hyungjun Kim
Applied Physics Letters 98, 142113 (2011)