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IEEE NANO 2010-Joint Symposium with NANO KOREA 2010
Improvement of Threshold voltage shift distribution characteristic in double layer NiSi2 nanocrystals for nano_floating gate memory
Sung-Jin Choi, Donghyoun Kim, Wangyu Song, Jihun Kwon, and Seung-Beck Lee
IEEE NANO 2010-Joint Symposium with NANO KOREA 2010 August 19, 2010 KINTEX, Korea