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Conference
Conference
ICM (International Conference on Magenetism) 2012
Fabrication of high aspect ratio nanoscale magnetic tunnel junction etch mask by oxygen plasma assisted resist trimming
Bongho Kim, Daehong Kim, Sungwoo Chun, Hyungyu Lee, Seonjun Choi, and Seung-beck Lee,
ICM 2012, July 13, 2012, Bexco, Busan, Korea