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Conference
Conference
ICM (International Conference on Magenetism) 2012
Negative electron-beam resist hard mask ion beam etching process
for the fabrication of nanoscale spin transfer torque magnetic random access memory device
Hyungyu Lee, Daehong Kim, Bongho Kim, Sungwoo Chun, Seonjun Choi, and Seung-beck Lee,
ICM 2012, July 12, 2012, Bexco, Busan, Korea