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Conference
Conference
EIPBN (Electron, Ion, and Photon Beam technology and Nanofabrication) 2012
Negative electron-beam resist hard mask ion-beam etching process for the fabrication of nanoscale magnetic tunnel junction
Sung-woo Chun, Daehong Kim, Jihun Kwon, Bongho Kim, Hyungyu Lee, Seonjun Choi and Seung-Beck Lee,
EIPBN 2012, June 29, 2012, Hilton Waikoloa Village, Hawaii