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Conference
Conference
Nano Korea Symposium 2012
Fabrication of Sub-10 nm Nanopore using Self-Aligned Double Layer Resist Processing Technique
Joonggeun Lee, Bongho Kim, Daehong Kim, Hyungyu Lee, Sungwoo Chun and Seung-Beck Lee,
Nano Korea Symposium 2012, August 16, 2012, COEX, Korea