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Conference
Conference
Nano Korea Symposium 2011
Fabrication of High Aspect Ratio Nanoscale Pattern Array by Oxygen Plasma Assisted Resist Trimming
Bongho Kim, Daehong Kim, Jihun Kwon, Sungwoo Chun, Seonjun Choi and Seung-Beck Lee
Nano Korea Symposium 2011, August 24, 2011, KINTEX, Korea