Equipment

CVD reactor 

Inhouse made showerhead CVD reactor, designed for large-scale growth of 2D materials. This system is a hot-wall vertical CVD reactor operating at ambient pressure and is heated by a three-zone furnace capable of reaching a maximum operating temperature of 1250 °C. Gas delivery is regulated by mass flow controllers (Brooks Instrument, 0260 unit). The CVD setup is equipped with a suite of gases including Ar, CH4, H2, N2 and NH3. 

Keithley 4200A-SCS Parameter Analyzer  - Configuration with 4 SMUs and 2 pre-amplifiers (fA)

The Keithley 4200A-SCS Parameter Analyzer is designed to significantly speed up device characterization, cutting setup-to-test time by up to 50% while maintaining high measurement accuracy.

Key features:

• High-precision C-V measurements: Using the 4215-CVU, it delivers low-noise capacitance measurements (down to single-digit femtofarads) across 1 kHz–10 MHz with an integrated 1 V AC source.

• Automatic switching: The 4200A-CVIV Multi-Switch seamlessly switches between I-V and C-V measurements without re-cabling or moving probes.

• Accurate low-current measurements: The 4201-SMU and 4211-SMU modules ensure stable measurements even in high-capacitance setups.

• Flexible configuration: Multiple SMU options, field-installable units, and optional preamplifiers allow customization for a wide range of I-V measurement needs with minimal downtime.

a. Frequency-Domain Thermoreflectance (FDTR)

The Frequency-Domain Thermoreflectance (FDTR) system is a high-precision, non-contact optical platform designed for the comprehensive thermal characterization of thin films and bulk materials. By modulating a pump laser to induce periodic surface heating and utilizing a probe laser to monitor the resulting frequency-dependent phase shift in reflectivity, the equipment accurately extracts critical thermal parameters, including thermal conductivity, interface thermal conductance, and volumetric heat capacity. This non-destructive technique is particularly effective for assessing the thermal performance of semiconductor devices, 2D materials, and complex heterostructures where traditional contact-based sensors fail due to interfacial resistance or scale limitations. The system offers superior depth-profiling capabilities across frequencies ranging from kHz to MHz, providing a robust solution in advanced electronics and materials science. 

b. Scanning Thermal Microscopy (SThM) - See Bruker Dimension Icon description below

c. Raman microscopy for spectroscopy and thermometry (*In cooperation with 2DFoundry group)

Smart litho printer 

In classical photolithography, a pattern is transferred onto a photoresist layer by exposing UV light through a hard photomask. The Smart Print UV (SP-UV) maskless lithography system uses the **Digital Micromirror Device **(DMD) technology to eliminate the need for a mask. A DMD chip is made out of millions of micromirrors which can rotate and either reflect light or not. This allows the projection of a detailed image onto the substrate, and gives the user a straightforward way to move from the design directly to the patterned sample without the use of a standard mask. The lack of photomask means more flexibility, and faster overall fabrication time 

Brunker Dimension Icon AFM (measuring modes include: Kelvin Probe Microscopy, conductive-AFM and Scanning Thermal Microscope -SThM, among others)

The Bruker Dimension Icon® is a high-performance atomic force microscope (AFM) designed for nanoscale research. It stands out for its low noise and low drift, allowing users to obtain accurate, artifact-free images in minutes instead of hours.

It delivers high resolution and faster measurements thanks to advanced scanning algorithms and sensors that reduce noise to extremely low levels. Technologies such as PeakForce Tapping® enable consistent acquisition of top-quality images.

Additionally, it features intuitive software and a wide range of extensions that simplify operation, making advanced techniques accessible without complex adjustments. Its flexible and user-friendly design makes it suitable for diverse scientific and industrial applications, setting a new standard in nanoscale imaging and manipulation.

a. OHAUS PR 423

The OHAUS PR 423 is a high‑precision laboratory balance designed for reliable and accurate weighing in scientific, educational, and industrial environments. With a maximum capacity of 420 grams, it is suitable for measuring small to medium‑sized samples with consistent accuracy. The balance offers a readability of 0.001 g (1 mg), allowing users to perform measurements that require fine sensitivity and detailed precision. Built with OHAUS’s reputation for durability and ease of use, the PR 423 features a robust construction, intuitive interface, and stable performance, making it a dependable instrument for routine laboratory tasks and precise analytical work.

b. Sonicators

c. Hot plates

d. Chemical benches and fume hood

Experimental set ups for thermal management of batteries and power electronics

• High power source

• Battery controller

• Surface thermocouples and temperature readers

a. E-Beam Evaporator. (EVM-6 Ferrotec) 

b. Atomic Layer Deposition. (CTECHnano Coating Technologies, Play Series 

c. Low – pressure Plasma System. (Tetra Diener Electronic) 

d. Spin Coater. (SMA SPINNER 6000 Pro) and filtration fume. 

e. High-Resolution UV Lithography. (SÜSS MicroTec MJB4 Mask Aligner) 

f. Sputtering 

g. Reactive Ion Etching. (NRE300 RIE System) 

More information: https://www.icmm.csic.es/index.php/en/icmm/micro-and-nanofabrication 

a. High Resolution SEM 

• High-resolution images with surface topography information.

• Quantitative chemical microanalysis by Energy Dispersive Spectroscopy (EDS). Mapping

b. XPS analysis *in cooperation with Dr. Javier Palomares