FACILITY

for DEVICE FABRICATION

E-beam Evaporator
@ BLDG 301

Vacuum Stacking & Annealing Chamber
@ BLDG 301

O2 Plasma Generator
@ BLDG 301

Solar Simulator
@ BLDG 301

ALD (Atomic Layer Deposition)
@ IAP

Maskless Photo Lithography System
@ IAP

for GROWTH PROCESS

MOCVD for 2D Semiconductors(4-inch)
(WS2, WSe2, MoS2, MoSe2)
@ ISRC

MOCVD for 2D Semiconductors(2-inch)
(InSe, WSe2, etc)
@ ISRC

CVD for Graphene (top)
Thermal CVD for TMDs (bottom)
@ ISRC

for MEASUREMENT/ANALYSIS

Probe Station & Stacking Stage
@ BLDG 301

Electrical Measurement System
@ BLDG 301

Scanning Photocurrent Microscopy
Micro PL & Raman Spectroscopy
@ BLDG 301

Optical Microscopy
(/w wide-field PL & Maskless lithography)
@ BLDG 301

Atomic Force Microscopy (AFM)
@ BLDG 301

FE-SEM
(Field Emission-SEM )
@ IAP

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