Laser Interference lithography

When the phase of waves are maintained, interference can occur between two waves.

Interference of light can induce selective patterning of photoresist, which is highly sensitive to the ultraviolet light source.

From a simple Lloyd’s mirror optical system, the period of the pattern can be expressed as below.

Λ=  λ/2sinθ

Compared to typical vacuum-based electron beam lithography, simple and low-cost nanoscale patterning can be conducted.

Due to the high surface area of nano-patterned structures, various applications including sensors, energy devices, and fuel cells can be used.