Monolithic 3D integration of heterogeneous single-crystalline semiconductors
Collaboration with KNU and MIT
Mechanical layer release techniques for freestanding membranes of III-V/III-N/Si
Layer-releasable remote epitaxy and 2D material-based layer transfer
Direct bonding-based reliable layer transfer technique for monolithic 3D integration
Monolithically integrated Si photonics on a single chip (via layer release/transfer)
Design/fabrication of low-footprint/high-speed/low-power active photonic devices and low-loss passive
devices together with Si CMOS electronic devices on a single chip
Co-integration of III-V layers on Si(100) to overcome limited optical properties of Si
III-V membrane laser on SiC beyond 200 Gbps (for B5G/6G)
Nano-optoelectronics & electronics
Collaboration with KNU and ETRI
Ultra-high-speed/low-power meta-structured microcavity technology for Si photonics
Nano-scale GaN power/RF HEMT fabrication and characterization
Novel characterization techniques for semiconductor materials and devices
Electrical contact and defect evaluation based on I–V/C–V characterization
FinFET/GAAFET contact modeling and characterization