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Hetero-Integrated Semiconductor Devices Lab
(첨단 이종반도체소자 연구실)

School of Electronic Engineering
Kumoh National Institute of Technology

Group Vision

2025년에 오픈한 신생 연구실로 서로 다른 전기적·광학적·기계적 특성을 갖는 단결정 반도체 층을 3차원으로 적층하여 새로운 형태의 전자소자 및
광전자소자를 개발하는 것을 연구 목표로 설정하고 있습니다. 이를 위해, 반도체 나노공정 및 이종집적공정 기술, 이종집적 기반 차세대 반도체소자
기술, 반도체소자 정밀 특성평가 기술 등 반도체 소자/공정 관련 다양한 연구를 폭넓게 수행하고 있습니다. 새로운 반도체 기술을 함께 개척하며
연구실과 함께 성장해 나갈 열정 있는 학생들의 연락을 기다립니다.

Our research group aims to develop a new class of cutting-edge electronic and optoelectronic devices through the three-dimensional stacking of single-crystalline semiconductor layers with distinct electrical, optical, and mechanical properties. Our research covers a broad spectrum of semiconductor device and fabrication technologies, including semiconductor nanofabrication, monolithic heterogeneous integration, hetero-integrated semiconductor devices, and precise characterization techniques for advanced semiconductor devices. We welcome highly motivated students who are excited to pioneer new semiconductor technologies and grow with our group.

국립금오공과대학교 디지털관 309호
E-mail: hp@kumoh.ac.kr

Research Field

Monolithic 3D (M3D) integration of heterogeneous single-crystalline semiconductors
- Layer release and transfer techniques for III-Vs on Si
- Freestanding membranes of III-V/III-N/Si
- Layer-releasable remote epitaxy and 2D material-based layer transfer

Nano-optoelectronics & electronics
- Meta-structured microcavity technology for Si photonics
- Ultra-high-speed and low-power membrane laser technology for B5G/6G optical communications
- Low-dimensional materials/structures, devices and characterizations
- Micro-/nano-fabrication

Novel characterization techniques for semiconductor materials and devices
- Electrical contact and defect evaluation based on I–V/C–V characterization
- FinFET/GAAFET contact modeling and characterization

Kumoh National Institute of Technology (KIT)
Bldg. Digital #309
61, Daehak-ro, Gumi-si, Gyeongbuk 39177, South Korea
Contact to hp@kumoh.ac.kr