The PI Khanikaev is an affiliate member of the newly constructed 3000 sq ft nanofabrication facility at the CUNY Advanced Science Research Center (ASRC). The ASRC is a new buildings that opened Fall 2014 in the south end of City College of CUNY. This fabrication facility located in ASRC has state of the art fabrication tools including.

v Electron beam lithography (Elionix 100 keV),

v Focused ion beam etcher,

v Reactive ion etcher,

v Plasma enhanced chemical vapor deposition, etc.

In addition, the PI Khanikaev group also has access to the cleanroom and characterization facility at the Center for functional Nanomaterials at Brookhaven National Laboratories, which include

v Nanofabrication and characterization tools

Ø Electron Beam Lithography Tool (EBL) - JEOL JBX6300FS

Ø Dual Beam Scanning Electron/Focused Ion Beam Microscope - FEI Helios Dual Beam (Cleanroom)

Ø Scanning Electron Microscope (SEM) - Hitachi 4800

Ø UV Mask Aligner - Karl Suss MA6

Ø Nanomill - Fischione 1040

Ø Dual Beam Ion Mill - Fischione 1010

Ø Circular Dichroism Spectrometer - Jasco J-815

Ø Dektak 150 Stylus Profilometer - Dektak 150

Ø Spectroscopic Ellipsometer - J.A. Woollam M-2000

Ø Non-contact Profilometer - Zygo New View 6000

Ø Reflectometer - Filmetrics F20

Ø Reactive Ion Etcher (RIE) - March Plasma

Ø Deep Reactive Ion Etcher, available w/Bosch process (DRIE)

Ø Plasma Asher - Plasma Etch PE-50

Ø Reactive Ion Etcher (RIE) - Trion Phantom III

Ø Electron Beam Deposition System - Kurt J. Lesker PVD75

Ø Sputter Coater - Kurt J. Lesker PVD75

Ø Sputter/Coater - Cressington 208HR DC

Ø Spin Coater - Brewer Science Cee 200CB

Ø Spin Coater - Suss

Ø Spin Coater - Brewer Science Cee 200CB

v Software

Ø Layout Beamer (pattern fracture & proximity effect correction)

Ø L-EDIT (CAD)

Besides the fabrication facilities, the PI’s group has the following facilities for modeling and characterization:

v Software

Ø Commercial Finite Element Method (FEM) solver COMSOL® Multiphysics with Electromagnetic (RF) module and LifeLink to MATLAB®.

Ø MATLAB® with optimization toolbox module.

Ø Wolfram® Mathematica

Ø A range of a custom built software, including implementations of multiple scattering and modal-matching techniques, FDTD and FDFD codes developed by Dr. Khanikaev.

v Characterization:

Ø MIRcat™ broadly tunable (4-12um) quantum cascade laser operating in both pulsed and CW modes.

Ø Nicolet™ Continuµm™ Infrared Microscope by Thermo Scientific.

Ø Nicolet™ 8700 Fourier transform infrared (FT-IR) Spectrometer by Thermo Scientific

Ø IR optical table-top unit for measuring angle-resolved transmission/reflection spectra (the detector mounted on 2D moving stage).

Ø 0.7 T Electromagnet

v Microwave facilities

Ø Two port microwave network analyzed Agilent (model E8363A)

Ø Custom built 3D motorized stage with submillimeter moving precision

Ø Anechoic chamber

v Computational facilities

Ø High performance workstation HP Z620 with two six-core Intel Xeon processors and 196Gb of RAM.

Ø Dell workstation with one six core processor and 64 Gb of RAM.

v Broadband Light Sources

Ø An Ocean Optics High (variable) Power Tungsten-Halogen Source for Absorption and Reflection Measurements

Ø Two Ocean Optics Tungsten-Halogen Source for Absorption and Reflection Measurements

Ø Nevtech 300 W CW Xe Source

Ø An Avantes, Deuterium-Halogen Source

v Monocromators, Spectrometers and Acquisition Systems

Ø An Ocean Optics High Resolution HR4000 (200 – 1100 nm) Spectrometer

Ø An Ocean Optics NIRQuest (900 – 2100 nm) Infrared Spectrometer

Ø FTIR Nicolet spectrometer coupled to IR microscope

As well as Departmental and Shared Facilities

v Cryogenic Equipment

Ø ARS Variable Temperature Cryostat (4 – 800 K)

o Equipped with four probe electrical outlet

o SI Model 9700-2-25 two channel temperature controller

Ø A Janis Research Variable temperature Closed Cycle System (8 – 300 K)

o Equipped with four probe electrical outlet

o SI Model 9700-2-25 two channel temperature controller

o Almax easyLab, Inc. Diamond Anvil Cell (DAC) operating up to 8GPa

Ø A Janis Research Continues Flow Cryostat

v Superconducting magnets:

Ø A 9T Alpha AL675 Superconducting Magnet System, equipped with five-fiber (UV-VIS and VIS-NIR) optical probe.

Ø A 9T Cryo Industries of America Optivcal Superconducting Magnet, equipped several fiber (UV-VIS and VIS-NIR) optical probes, and four wire electrical input

v Lasers

Ø A multi-line 5W Coherent FreD INNOVA-90 Ar-ion laser (with three Deep UV lines, Visible lines, and UV lines)

Ø A CW Omnichrome 40 mW He-Cd Laser (442 nm)

Ø A Newport N₂ pulsed laser (337 nm base wavelength) with a Dye Module

Ø Photonic Products 12 mW 785 nm and 20 mW 805 nm Diode Lasers

Ø Set of diode lasers in 630 - 680 nm range

Ø A 50 mW 405 nm diode laser

Ø A 200 mW 405 nm diode laser (with heat-sink)

Ø A 10 mW 532 nm solid state laser

v AC/DC Hall Effect Measurements Setup

Ø A Lakeshore 1 T Electromagnet

Ø A Stanford Research 830 Two Channel Lock-In Amplifier

Ø A Keithly 6221 DC/AC Current Source

Ø Various Voltage and Current Meters

Ø Optical excitation via fiber coupled laser (see above)

Ø A Keithly 485 picoammeter

v Other Relevant Equipment

Ø Nikon Optical Microscope

Ø Melles Griot Optical Table Optical Table (5’ by 12’)

Ø TMC Breadborad on the Solid Wood Table (4’ by 8’)

Ø Thermoline oven for sample annealing (air or nitrogen)

v LabView Control System

v CVD Growth based on a Linberg-Blue high temperature three-zone furnace coupled with four gas supply system (NH₃, H₂, Ar, and N)

v Additional characterization facilities

Ø A FEI Quanta Scanning Electron Microscope equipped with the Nano Pattern Generation System (NGS) from Nabity Lithography

Ø Laboratory for Nano and Micro Photonics (LaNMP) at Queens College of CUNY with a class 1000 Cleanroom for nano/micro-fabrication:

Ø Reactive ion etcher (RIE) for dry etching of semiconductors and dielectric materials (Plasmatherm system)

Ø Plasma enhanced chemical vapor deposition system (PECVD) for depositing dielectric materials such as silicon nitride and silicon dioxide (Plasmatherm system)

Ø Spin coater for depositing thin layers of photoresists, colloidal quantum dots etc. (Laurell Technologies)

Ø Contact mask aligner with < 0.5 mm resolution for standard photolithography and UV exposure (ABM Mask Aligner)

Ø Degassing chamber

Ø Optical microscope, surface profiler, etc.

Ø Hitachi P014B S-570 scanning electron microscope (SEM)

Ø Princeton X-ray Analysis System

Ø Two-gun magnetron sputtering chamber with optical thickness monitors.

Other Facilities

v Fully equipped machine shop

v Electrical & electronics shop (with wide selection of electronic equipment)

v Center for Computational Infrastructure for the Sciences