Facilities & Capabilities

Metal-organic chemical vapor deposition (MOCVD) of 2D materials (WS2, WSe2, MoS2, MoSe2)

2D materials transfer to make heterostructures

2D device fabrication by photolithography

Micro-Raman measurements with 441.6 nm, 532.0 nm, &  632.8 nm excitation down to 5 cm-1

UV Micro-Raman spectroscopy with 325 nm excitation. (down to 50 cm-1)

Reflection and transmission contrast measurements (200~1100 nm)

Micro-Photoluminescence measurements (350~1100 nm)

Photoluminescence excitation spectroscopy (420~800 nm)

1D and 2D Hyperspectral imaging setup 

Temperature dependent optical/electrical measurements (3K ~350K)

Second harmonic generation (SHG) spectroscopy (excitation: 900~1700 nm, ~10 ps)

Hanbury-Brown-Twiss (HBT) interferometer for quantum correlation measurements (400~1000 nm)

Time resolved photoluminescence (400~1000 nm, time resolution few tens of ps)

Broadband absorption and photoluminescence measurement (250~1700 nm)