January 19 - 21, 2021 (JST)

International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021

Venue: Online (zoom)

Registration fee: Free of charge

The International Symposium on Wide Gap Semiconductor Growth, Process and Device Simulation 2021 (ISWGPDs 2021) will be held online from January 19 to 21, 2021 (JST). The Symposium will present high-impact scientific and technological advances in growth, process and device simulations based on wide bandgap semiconductors: III-nitrides, SiC, oxides, diamond and so on.

Plenary Speaker

Atsushi Oshiyama

Nagoya University

Keynote Speakers

Mauro Boero

University of Strasbourg

Stanislaw Krukowski

Institute of High Pressure Physics, PAS

Pawel Kempisty

Institute of High Pressure Physics, PAS

Yosuke Harashima

Nagoya University

Masato Oda

Wakayama University

Yu-ichiro Matsushita

Tokyo Institute of Technology

Iza Gorczyca

Institute of High Pressure Physics, PAS

Nobuya Mori

Osaka University

Akira Kusaba

Kyushu University

Toru Akiyama

Mie University

Yoshinao Kumagai

Tokyo University of Agriculture and Technology

Invited Speakers

Takahiro Kawamura

Mie University

Konrad Sakowski

Institute of High Pressure Physics, PAS

Zheng Ye

Nagoya University

Satoshi Watanabe

The University of Tokyo

Outstanding Poster Award

  • Kenta Chokawa, Kenji Shiraishi, Atsushi Oshiyama,
    Atomic and electronic structures at the (Al2O3)1-x(SiO2)x/GaN interfaces

  • Soma Sakakibara, Kenta Chokawa, Masaaki Araidai, Akira Kusaba, Yoshihiro Kangawa, Kenji Shiraishi,
    Theoretical study of the effects of H2 and NH3 on the TMG decomposition process in GaN crystal growth