The OCVD (Oxidative Chemical Vapor Deposition) process is a unique method that deposits conductive polymer thin films in a vapor phase. Through this process, it is possible to implement organic transistors with thin line widths, which is eligible to be a next-generation neuromorphic device. Most notably, HTFL applies this process in fields such as semiconductor sensors, secondary batteries, and all-solid-state batteries, offering innovative solutions that did not exist before in various industries. 

Unlike the conventional ALD process used for forming thin films on wafers, HTFL applies the ALD process to form thin coating layers on powders, which we call PALD (Powder Atomic Layer Deposition). Through this process, we are providing new solutions in various fields, such as EMC materials for next-generation packaging, electrolyte stabilization for all-solid-state batteries, and X-ray scintillators.